热处理对双离子束溅射SiO2薄膜力学及热力学特性的影响 | 红外与激光工程 -- 中国光学期刊网

红外与激光工程, 2018, 47 (6): 0621002, 网络出版: 2018-09-08

热处理对双离子束溅射SiO2薄膜力学及热力学特性的影响

Influence of thermal annealing on mechanical and thermoelastic characteristics of SiO2 films produced by DIBS

论文大纲

冷健季一勤刘华松庄克文刘丹丹

作者单位

天津市薄膜光学重点实验室天津津航技术物理研究所, 天津 300300

双离子束溅射 SiO2薄膜退火力学及热力学特性 dual ion beam sputtering (DIBS) SiO2 film annealing mechanical and thermoelastic characteristics

摘要

光学薄膜的力学及热力学特性决定了光学系统性能的优劣。采用双离子束溅射的方法在硅<110>和肖特石英Q1基底上制备了SiO2薄膜, 并对制备的膜层进行退火处理。系统研究了热处理前后SiO2薄膜的力学及热力学特性。研究结果表明, 750 ℃退火条件下SiO2薄膜的弹性模量(Er)增加到72 GPa, 膜层硬度增加到10 GPa。镀完后未经退火处理的SiO2薄膜表现为压应力, 但是应力值在退火温度达到450 ℃以上时急剧降低, 说明热处理有助于改善SiO2薄膜内应力。经退火处理的SiO2薄膜泊松比(vf)为0.18左右。退火前后SiO2薄膜的杨氏模量(Ef)都要比石英块体材料大, 并且750 ℃退火膜层杨氏模量增加了50 GPa以上。550 ℃退火的SiO2薄膜热膨胀系数(αf)从6.78×10-7 ℃-1降到最小值5.22×10-7 ℃-1。

Abstract

Mechanical and thermoelastic charecteristics of optical films are important to ensure the performance of optical coating systems. SiO2 films were prepared by dual ion beam sputtering (DIBS) on Si <110> and Schott Q1. The mechanical and thermoelastic properties of films as-deposited and annealed were systematically investigated. The results show that reduced Young′s modulus (Er) is elevated to 72 GPa while the film was annealed at 750 ℃, and hardness (H) increases to over 10 GPa. The as-deposited films show compressive stress and the stress could be dramatically released while annealed over 450 ℃, incicating that heat treatment could improve the internal stress of SiO2 film. Poisson′s ratio (vf) of annealed SiO2 films is around 0.18, and Young′s modulus (Ef) of as-deposited and annealed films is larger than that of fused silica, and elevated over 50 GPa while annealed at 750 ℃. Thermal expansion coefficient (αf) decreases from 6.78×10-7 ℃-1 to the minimum value 5.22×10-7 ℃-1 while annealed at 550 ℃.

参考文献

[1] Liu Huasong, Wang Lishuan, Jiang Yugang, et al. Adjustments of refractive index and stress of SiO2 films prepared by IBS technology[J]. Optics and Precision Engineering, 2013, 21(9): 2238-2243. (in Chinese)

[2] Zhang Jinsheng, Zhang Jinlong, Ning Yongqiang, et al. Design and optimization of 1 555 nm broad-bandpass filter film[J]. Chinese Optics, 2013, 21(9): 557-562. (in Chinese)

[3] Ma Hongping, Cheng Xinbin, Zhang Jinlong, et al. Damage growth characteristics of artificial nodules prepared by different processes [J]. Infrared and Laser Engineering, 2017, 46(5): 0521001. (in Chinese)

[4] Lu J Y, Zhao Q N, Hou S H, et al. Study on antireflection of TiO2-SiO2/SiO2 double-layer films prepared by sol-gel method[J]. Adv Mater Res, 2012, 591-593:1012-1016.

[5] Cai Xikun, Zhang Lichao, Shi Guang, et al. Low stress DUV optical coatings deposited by ion beam sputtering [J]. Chinese Optics, 2016, 9(6): 649-655. (in Chinese)

[6] Liu Huasong, Jiang Chenghui, Wang Lishuan, et al. Effects of annealing on properties of Ta2O5 thin films deposited by ion beam sputtering[J]. Optics and Precision Engineering, 2014, 22(11): 2645-2651. (in Chinese)

[7] Jiang Yugang, Wang Lishuan, Liu Huasong, et al. Analysis on effects of thermal treatment on refractive index and absorption properties of SiO2 film[J]. Infrared and Laser Engineering, 2014, 43(4): 3334-3337. (in Chinese)

[8] Ji Yiqin, Jiang Yugang, Liu Huasong, et al. Analysis on effects of thermal treatment on structural characteristic of ion beam sputtering SiO2 films[J]. Infrared and Laser Engineering, 2013, 42(2): 418-422. (in Chinese)

[9] Zhou B, Prorok B C. A new paradigm in thin film indentation [J]. J Mater Res, 2010, 25: 1671-1678.

[10] Klemberg-Sapieha J E, Oberste-Berghaus J, Martinu L, et al. Mechanical characteristics of optical coatings prepared by various techniques: a comparative study [J]. Appl Opt, 2004, 43: 2670-2679.

[11] Thielsch R, Gatto A, Kaiser N. Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep ultraviolet spectral region[J]. Appl Opt, 2002, 41: 3211-3217.

冷健, 季一勤, 刘华松, 庄克文, 刘丹丹. 热处理对双离子束溅射SiO2薄膜力学及热力学特性的影响[J]. 红外与激光工程, 2018, 47(6): 0621002. Leng Jian, Ji Yiqin, Liu Huasong, Zhuang Kewen, Liu Dandan. Influence of thermal annealing on mechanical and thermoelastic characteristics of SiO2 films produced by DIBS[J]. Infrared and Laser Engineering, 2018, 47(6): 0621002.

论文摘要 Full Text 图 & 表补充材料基本信息知识挖掘 Metrics PDF全文参考文献 & 引文

引用该论文： TXT | EndNote

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务，点击此处了解我们的隐私策略。如您需继续使用本网站，请您授权我们使用本地 cookie 来保存部分信息。

您最值得信赖的光电行业旗舰网络服务平台!

快速查询高级查询

最近搜索：

大家在搜：人工智能图像处理光子

热门搜索：机器视觉光通信光纤传感器