离子束溅射氧化钽薄膜光学特性的热处理效应

主要研究了离子束溅射制备的氧化钽薄膜在大气氛围下热处理对其光学特性的影响规律。实验中热处理温度范围的选择为150~550 ℃, 间隔为200 ℃。研究中分别采用介电常数的Cody-Lorentz色散模型和振子模型对氧化钽薄膜的能带特性(1~4 eV)和红外波段(400~4 000 cm-1)的微结构振动特性进行了表征。研究结果表明, 在150 ℃和350 ℃之间出现热处理温度转折点, 即热处理温度高于此值时消光系数增加。Urbach能量的变化与消光系数趋势相同, 而禁带宽度的变化与消光系数恰好相反。通过红外微结构振动特性分析, 薄膜中仍存在亚氧化物的化学计量缺陷。

Abstract

The effect of annealing in atmospheric environment on Ta2O5 thin films was researched, which were prepared by ion beam sputtering. The annealing temperatures ranged from 150 ℃ to 550 ℃, and the interval was 200 ℃. The optical band gap (1-4 eV) of the Ta2O5 thin film was characterized by the Cody-Lorentz dielectric model. And the microstructure vibration was characterized by the oscillator model in the range of infrared region(400-4 000 cm-1). The results show that the turning point of the annealing temperature appeared between 150 ℃ and 350 ℃. The extinction coefficient of the thin film increased when the annealing temperature was above the turning point. The variation of Urbach energy was in accordance with the extinction coefficient, but the variation of band gap was opposite. By analyzing the microstructure vibration in infrared, it′s found that the stoichiometry defect of the protoxide was in the Ta2O5 films.

参考文献

[1] Detlev Ristau, Tobias Gross. Ion beam sputter coatings for laser technology[C]//SPIE, 2005, 5963: 596313.

[2] Yoon S G, Kanga S M, Junga W S, et al. Effect of assist ion beam voltage on intrinsic stress and optical properties of Ta2O5 thin films deposited by dual ion beam sputtering[J]. Thin Solid Films, 2008, 516(11): 3582-3585.

[3] Demiryont H, Sites J R, Geib K. Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering [J]. Applied Optics, 1985, 24(4):490-495.

[4] Yoon S G, Kang S M, Yoon D H. Post-annealing effects on the structural properties and residual stress of Ta2O5 thin films deposited by ion beam sputtering [J]. Journal of Optoelectronics & Advanced Materials, 2007, 9(5): 1246-1249.

[5] Masse J P, Szymanowski H, Zabeida O, et al. Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5, and Nb2O5, films [J]. Thin Solid Films, 2006, 515(4): 1674-1682.

[6] Chandra S V J, Rao G M, Uthanna S. Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films [J]. Crystal Research & Technology, 2007, 42(3): 290-294.

[7] 刘华松, 姜承慧, 王利栓,等. 热处理对离子束溅射Ta2O5薄膜特性的影响[J]. 光学精密工程, 2014, 22(10): 2645-2651.

Liu Huasong, Jiang Chenghui, Wang Lishuan, et al. Effects of annealing on properties of Ta2O5 thin films deposited by ion beam sputtering[J]. Optics & Precision Engineering, 2014, 22(10): 2645-2651. (in Chinese)

[8] Ferlauto A S, Ferreira G M, Pearce J M, et al. Analytical model for the optical functions of amorphous semiconductors from the near infrared to ultraviolet: Applications in thin film photovoltaics[J]. Journal of Applied Physics, 2002, 92(5): 2424-2436.

[9] 刘华松, 季一勤, 张锋, 等. 金属氧化物薄膜在中波红外光谱区内光学常数色散特性[J]. 光学学报, 2014, 34(8): 0831003.

Liu Huasong, Ji Yiqin, Zhang Feng, et al. Dispersive properties of optical constants of some metallic oxide thin films in the near infrared regions [J]. Acta Optica Sinica, 2014, 34(8): 0831003. (in Chinese)

[10] 季一勤, 姜玉刚, 刘华松, 等. 热处理对离子束溅射 SiO2薄膜结构特性的影响分析[J]. 红外与激光工程, 2013, 42(2): 418-422.

Ji Yiqin, Jiang Yugang, Liu Huasong, et al. Analysis on effects of thermal treatment on structural characteristic of ion beam sputtering SiO2 films[J]. Infrared and Laser Engineering, 2013, 42(2): 418-422. (in Chinese)

[11] Bright T J, Watjen J I, Zhang Z M, et al. Infrared optical properties of amorphous and nanocrystalline Ta2O5 thin films [J]. Journal of Applied Physics, 2013, 114(8): 083515.

[12] Klemberg-Sapieha J E, Oberste-Berghaus J, Martinu L, et al. Mechanical characteristics of optical coatings prepared by various techniques: a comparative study.[J]. Applied Optics, 2004, 43(13): 2670-2679.

王利栓, 杨霄, 刘丹丹, 姜承慧, 刘华松, 季一勤, 张锋, 樊荣伟, 陈德应. 离子束溅射氧化钽薄膜光学特性的热处理效应[J]. 红外与激光工程, 2018, 47(3): 0321004. Wang Lishuan, Yang Xiao, Liu Dandan, Jiang Chenghui, Liu Huasong, Ji Yiqin, Zhang Feng, Fan Rongwei, Chen Deying. Annealing effect of the optical properties of tantalum oxide thin film prepared by ion beam sputtering[J]. Infrared and Laser Engineering, 2018, 47(3): 0321004.

离子束溅射氧化钽薄膜光学特性的热处理效应

关于本站 Cookie 的使用提示

全站搜索

离子束溅射氧化钽薄膜光学特性的热处理效应

相关论文

相关资讯

关于本站 Cookie 的使用提示

全站搜索