Chinese Optics Letters, 2007, 5 (5): 308, Published Online: Jun. 27, 2007
Aluminum film microdeposition at 775 nm by femtosecond laser-induced forward transfer Download: 570次
飞秒激光 激光诱导向前转移技术 薄膜 微沉积 140.7090 Ultrafast lasers 220.4000 Microstructure fabrication 160.3900 Metals
Abstract
Micro-deposition of an aluminum film of 500-nm thickness on a quartz substrate was demonstrated by laser-induced forward transfer (LIFT) using a femtosecond laser pulse. With the help of atomic force microscopy (AFM) and scanning electron microscopy (SEM), the dependence of the morphology of deposited aluminum film on the irradiated laser pulse energy was investigated. As the laser fluence was slightly above the threshold fluence, the higher pressure of plasma for the thicker film made the free surface of solid phase burst out, which resulted in that not only the solid material was sputtered but also the deposited film in the liquid state was made irregularly.
Li Yang, Qingyue Wang, Xiaochang Ni, Yinzhong Wu, Wei Jia, Lu Chai. Aluminum film microdeposition at 775 nm by femtosecond laser-induced forward transfer[J]. Chinese Optics Letters, 2007, 5(5): 308.