磁控溅射法制备氧化钨薄膜的膜层微观结构对电致变色性能的影响 下载: 887次
初文静, 张喜强, 施瑕玉, 郑友伟, 林俊良, 陈明亿, 林金锡, 林金汉, 袁宁一. 磁控溅射法制备氧化钨薄膜的膜层微观结构对电致变色性能的影响[J]. 激光与光电子学进展, 2017, 54(11): 113103.
Chu Wenjing, Zhang Xiqiang, Shi Xiayu, Zheng Youwei, Lin Junliang, Chen Mingyi, Lin Jinxi, Lin Jinhan, Yuan Ningyi. Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance[J]. Laser & Optoelectronics Progress, 2017, 54(11): 113103.
[1] Deb S K. Optical and photoelectric properties and colour centres in thin films of tungsten oxide[J]. Philosophical Magazine, 1973, 27(4): 801-822.
[2] Dong D M, Wang W W, Dong G B, et al. Electrochromic properties of NiOx∶H films deposited by DC magnetron sputtering for ITO/NiOx∶H/ZiO2/WO3/ITO device[J]. Applied Surface Science, 2015, 357: 799-805.
[3] 张建鹏, 黄美东, 李园, 等. 磁控溅射功率对光学氧化钒薄膜结构和性能的影响[J]. 中国激光, 2015, 42(8): 0807001.
[4] 张易君, 张粞程, 栾明昱, 等. NbSiN薄膜的制备及光学性能研究[J]. 激光与光电子学进展, 2017, 54(3): 033101.
[5] Madhavi V, Jeevan Kumar P, Kondaiah P, et al. Effect of molybdenum doping on the electrochromic properties of tungsten oxide thin films by RF magnetron sputtering[J]. Ionics, 2014, 20(12): 1737-1745.
[6] 孙喜莲, 方燕群, 曹洪涛. 钽掺杂氧化钨薄膜电致变色性能[J]. 光学学报, 2014, 34(10): 1031001.
[7] Yin Y, Lan C Y, Guo H Y, et al. Reactive sputter depositon of WO3/Ag/WO3 film for indium tin oxide (ITO)-free electrochromic devices[J]. ACS Applied Materials & Interfaces, 2016, 8(6): 3861-3867.
[8] Ma D Y, Shi G Y, Wang H Z, et al. Morphology-tailored synthesis of vertically aligned 1D WO3 nano-structure films for highly enhanced electrochromic performance[J]. Journal of Materials Chemistry A, 2013, 1(3): 684-691.
[9] Feng W, Wu G M, Gao G H. Ordered mesoporous WO3 film with outstanding gasochromic properties[J]. Journal of Materials Chemistry A, 2014, 2(3): 585-590.
[10] 温佳星, 王美涵, 彭洋. 磁控溅射沉积气致变色WO3薄膜研究进展[J]. 中国材料进展, 2016, 35(1): 57-62.
Wen Jiaxing, Wang Meihan, Peng Yang. Progress in gasochromic WO3 thin films deposited by magnetron sputtering[J]. Materials China, 2016, 35(1): 57-62.
[11] 罗乐平, 赵青南, 刘旭, 等. 基片温度对直流反应磁控溅射法制备氧化钨电致变色材料循环寿命的影响[J]. 硅酸盐通报, 2016, 35(6): 1847-1850.
Luo Leping, Zhao Qingnan, Liu Xu, et al. Influence of substrate temperatures on the cyclic life of electrochromic tungsten oxide (WO3) films deposited by reaction DC magnetron sputtering[J]. Bulletin of the Chinese Ceramic Society, 2016, 35(6): 1847-1850.
[12] Wang Y Q, Chu W J, Wang S S, et al. Simple synthesis and photoelectrochemical characterizations of polythiophene/Pd/TiO2 composite microspheres[J]. ACS Applied Materials & Interfaces, 2014, 6(22): 20197-20204.
[13] Kattouf B, Ein-Eli Y, Siegmann A, et al. Hybrid mesostructured electrodes for fast-switching proton-based solid state electrochromic devices[J]. Journal of Materials Chemistry C, 2013, 1(1): 151-159.
[14] Kraft A, Rottmann M, Heckner K-H. Large-area electrochromic glazing with ion-conducting PVB interlayer and two complementary electrodeposited electrochromic layers[J]. Solar Energy Materials and Solar Cells, 2016, 90(4): 469-476.
[15] Huang H, Tian J, Zhang W K, et al. Electrochromic properties of porous NiO thin film as a counter electrode for NiO/WO3 complementary electrochromic window[J]. Electrochimica Acta, 2011, 56(11): 4281-4286.
初文静, 张喜强, 施瑕玉, 郑友伟, 林俊良, 陈明亿, 林金锡, 林金汉, 袁宁一. 磁控溅射法制备氧化钨薄膜的膜层微观结构对电致变色性能的影响[J]. 激光与光电子学进展, 2017, 54(11): 113103. Chu Wenjing, Zhang Xiqiang, Shi Xiayu, Zheng Youwei, Lin Junliang, Chen Mingyi, Lin Jinxi, Lin Jinhan, Yuan Ningyi. Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance[J]. Laser & Optoelectronics Progress, 2017, 54(11): 113103.