激光与光电子学进展, 2017, 54 (11): 113103, 网络出版: 2017-11-17
磁控溅射法制备氧化钨薄膜的膜层微观结构对电致变色性能的影响 下载: 887次
Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance
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初文静, 张喜强, 施瑕玉, 郑友伟, 林俊良, 陈明亿, 林金锡, 林金汉, 袁宁一. 磁控溅射法制备氧化钨薄膜的膜层微观结构对电致变色性能的影响[J]. 激光与光电子学进展, 2017, 54(11): 113103. Chu Wenjing, Zhang Xiqiang, Shi Xiayu, Zheng Youwei, Lin Junliang, Chen Mingyi, Lin Jinxi, Lin Jinhan, Yuan Ningyi. Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance[J]. Laser & Optoelectronics Progress, 2017, 54(11): 113103.