磨料对硒化锌雾化施液化学机械抛光的影响
李庆忠, 施卫彬, 夏明光. 磨料对硒化锌雾化施液化学机械抛光的影响[J]. 半导体光电, 2018, 39(6): 815.
LI Qingzhong, SHI Weibin, XIA Mingguang. Effect of Abrasive on Ultrasound Fine Atomization CMP of Zinc Selenide[J]. Semiconductor Optoelectronics, 2018, 39(6): 815.
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Mo Yidong, Li Qingzhong. Performance of TFT-LCD glass substrate polishing slurry in ultrasound fine atomization CMP［J］. J. of Material Science & Engin., 2015, 33(3): 438-441.
李庆忠, 施卫彬, 夏明光. 磨料对硒化锌雾化施液化学机械抛光的影响[J]. 半导体光电, 2018, 39(6): 815. LI Qingzhong, SHI Weibin, XIA Mingguang. Effect of Abrasive on Ultrasound Fine Atomization CMP of Zinc Selenide[J]. Semiconductor Optoelectronics, 2018, 39(6): 815.
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