红外与激光工程, 2005, 34 (4): 394, 网络出版: 2006-05-25   

硒化锌基底8~12 μm高性能增透膜的研究

High performance infrared antireflection films on ZnSe substrate for 8~12 μm
潘永强 1,2,*朱昌 1
作者单位
1 西安工业学院,光电工程学院,陕西,西安,710032
2 西安电子科技大学理学院,陕西,西安,710071
摘要
为了提高硒化锌基底的透过率以及膜层的机械强度,对硒化锌基底上高性能的红外宽带减反射膜的设计与制备工艺进行了研究.介绍了红外宽带减反射膜的膜料选择、膜系的设计以及采用离子束辅助沉积该膜系的过程,给出了用该方法制备的8~12μm波段宽带减反射膜的实测光谱曲线,其峰值透过率高达99%以上,在设计波段范围内平均透过率大于98%,膜层附着性能好,光机性能稳定.这对于红外光学系统的应用具有十分重要的意义.
Abstract
In order to enhance transmission rate and mechanical intensity of ZnSe, the design and de- position of high performance infrared antireflection films on ZnSe substrate by ion beam assisted deposi- tion are discussed. The choice of films materials and the design of films system are introduced.The mea- sured spectral curve of 8~12 μm wavelength range antireflection films deposition by this method has been given. The experimental results show that the films have good characteristics such as a peak transmi" ssion of more than 99%,an average transmission in the designed wavelength range of greater than 98%, good adherence and stability of optical and mechanical properties. These are important for the application of infrared optical system.
参考文献

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潘永强, 朱昌. 硒化锌基底8~12 μm高性能增透膜的研究[J]. 红外与激光工程, 2005, 34(4): 394. 潘永强, 朱昌. High performance infrared antireflection films on ZnSe substrate for 8~12 μm[J]. Infrared and Laser Engineering, 2005, 34(4): 394.

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