YbF<sub>3</sub>沉积速率对红外激光薄膜表面缺陷的影响

张耀平; 许鸿; 凌宁; 张云洞

强激光与粒子束, 2005, 17 (7): 1019, 网络出版: 2006-04-28

YbF₃沉积速率对红外激光薄膜表面缺陷的影响

Influence of YbF₃ deposition rate on surface defect density of infrared laser thin film

论文大纲

张耀平 ^1,2许鸿 ¹凌宁 ¹张云洞 ¹

作者单位

¹ 中国科学院光电技术研究所,四川,成都,610209

² 中国科学院研究生院,北京,100039

激光薄膜沉积速率缺陷密度损伤阈值 Laser thin film Deposition rate Defect density Laser damage threshold

摘要

在介绍了薄膜缺陷的特点及成因的基础上,分析了YbF₃沉积速率对红外激光薄膜表面缺陷密度的影响,得出了镀制激光薄膜所需的合适速率.结果表明:薄膜表面缺陷主要以节瘤缺陷与陷穴缺陷为主,其缺陷密度随YbF₃沉积速率的减小基本表现为减小的趋势,当ZnS沉积速率约为0.2 nm/s,YbF₃沉积速率约为0.4 nm/s时,可得到比较满意的激光薄膜,薄膜表面缺陷密度仅为0.000 675.

Abstract

The properties and derivation of defects in thin film are introduced in this paper. The influence of the deposition rate of YbF₃ on the surface defect density of infrared laser thin film is analyzed. The appropriate deposition rate of YbF₃ on the thin film is put forward. The result shows that the nodules and concave holes are the main defects in the infrared laser thin film, and that the defect density decreases with the decrease of deposition rate of YbF₃. The defect density is only 0.000 675 when deposition rates are 0.4 nm/s for ZnS and 0.2 nm/s for YbF₃, respectively.

参考文献

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张耀平, 许鸿, 凌宁, 张云洞. YbF₃沉积速率对红外激光薄膜表面缺陷的影响[J]. 强激光与粒子束, 2005, 17(7): 1019. ZHANG Yao-ping, XU Hong, LING Ning, ZHANG Yun-dong. Influence of YbF₃ deposition rate on surface defect density of infrared laser thin film[J]. High Power Laser and Particle Beams, 2005, 17(7): 1019.

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