太赫兹科学与电子信息学报, 2022, 20 (9): 877, 网络出版: 2022-10-28  

浮栅器件的单粒子翻转效应

Study on Single Event Upset of floating gate device
作者单位
1 湘潭大学材料科学与工程学院, 湖南湘潭 411105
2 上海精密计量测试研究所, 上海 201109
3 西北核技术研究院, 陕西西安 710024
4 中国原子能科学研究院, 北京 102488
摘要
基于中国原子能科学研究院的 HI-13加速器, 利用不同线性能量传输(LET)值的重离子束流对 4款来自不同厂家的 90 nm特征尺寸 NOR型 Flash存储器进行了重离子单粒子效应试验研究, 对这些器件的单粒子翻转(SEU)效应进行了评估。试验中分别对这些器件进行了静态和动态测试, 得到了它们在不同 LET值下的 SEU截面。结果表明高容量器件的 SEU截面略大于低容量的器件; 是否加偏置对器件的翻转截面几乎无影响; 两款国产替代器件的 SEU截面比国外商用器件高。国产替代器件 SEU效应的 LET阈值在 12.9 MeV·cm2/mg附近, 而国外商用器件 SEU效应的 LET阈值处于 12.9~32.5 MeV·cm2/mg之间。此外, 针对单粒子和总剂量效应对试验器件的协同作用也开展了试验研究, 试验结果表明总剂量累积会增加 Flash存储器的 SEU效应敏感性, 分析认为总剂量效应产生的电离作用导致了浮栅上结构中的电子丢失和晶体管阈值电压的漂移, 在总剂量效应作用的基础上 SEU更容易发生。
Abstract
Four types of NOR Flash memories from different manufacturers with 90 nm feature sizes are studied, based on the HI-13 accelerator of the China Academy of Atomic Energy. Aiming to evaluate the Single Event Upset(SEU) effect for those memories, heavy-ion with different Linear Energy Transfer (LET) values is utilized to irradiate the devices. Both static and dynamic tests are performed to obtain the SEU cross-section of the device. Test results show that the memory with large capacities has a slightly bigger SEU cross-section than the devices with small capacities. There is almost no impact on the SEU cross-section of the device with or without bias. The SEU cross-section of the domestic alternative devices is bigger than that of two foreign commercial devices. The LET threshold of the domestic alternative devices is nearly at 12.9 MeV·cm2/mg, while that value of foreign commercial devices between 12.9~32.5 MeV·cm2/mg. The SEU cross-section results from static and dynamic tests have good consistency, which indicates test mode has no obvious influence on SEU effect. In addition, the synergistic effects of Single Event Effect(SEE) and Total Ionizing Dose(TID) effect for Flash memory are also studied, the results show that TID dose will increase the sensitivity of the device to SEE. The analysis shows that the ionization caused by the TID effect leads to the electron leakage from the floating gate and the drift of transistor threshold voltage, therefore SEU is more likely to occur on the basis of TID effect.

琚安安, 郭红霞, 丁李利, 刘建成, 张凤祁, 张鸿, 柳奕天, 顾朝桥, 刘晔, 冯亚辉. 浮栅器件的单粒子翻转效应[J]. 太赫兹科学与电子信息学报, 2022, 20(9): 877. JU Anan, GUO Hongxia, DING Lili, LIU Jiancheng, ZHANG Fengqi, ZHANG Hong, LIU Yitian, GU Chaoqiao, LIU Ye, FENG Yahui. Study on Single Event Upset of floating gate device[J]. Journal of terahertz science and electronic information technology, 2022, 20(9): 877.

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