连续微光学元件在光刻胶上的面形控制

曾红军; 杜春雷; 王永茹; 白临波; 邓启凌; 陈波; 郭履容; 袁景和

光学学报, 2000, 20 (5): 691, 网络出版: 2006-08-09

连续微光学元件在光刻胶上的面形控制

Profile Control of Continuous Relief MOE in Photoresist

论文大纲

曾红军 ¹杜春雷 ¹王永茹 ¹白临波 ¹邓启凌 ¹陈波 ²郭履容 ²袁景和 ²

作者单位

¹ 中国科学院光电所微细加工光学技术国家重点实验室,成都 610209

² 四川大学信息光学研究中心,成都 610064

连续微光学元件光刻胶线性倒易关系面形控制。 continuous micro-optic element linear property of photoresist reciprocal equation profile control.

摘要

介绍了连续微光学元件在光刻胶上的面形控制方法。分析了光刻胶及显影液在制作二元和连续元件中所存在的差别;导出具有倒易关系的浮雕深度表达式和适用的范围,并以此指导面形的控制,对光刻胶进行适当的改造以适应连续微光学元件的制作。本文还给出了实验验证,制作出了多种质量优良的连续微光学元件,并对典型元件的面形进行了评价。

Abstract

The method on profile-control of micro-optic element in photoresist was presented.The difference between fabrication of binary optic element and that of continuous-relief MOE may not be ignored.A reciprocal equation among the depth,exposure,density of the developer and its etching time was inferred,with the appropriate conditions that proved to be useful for the MOE fabrications.The property and treatment of the photoresist were modified in order to meet the conditions of the reciprocal equation.As the result,some MOEs having accurate depth and good surface performance,with the evaluation of a typical element,were shown.

参考文献

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曾红军, 杜春雷, 王永茹, 白临波, 邓启凌, 陈波, 郭履容, 袁景和. 连续微光学元件在光刻胶上的面形控制[J]. 光学学报, 2000, 20(5): 691. 曾红军, 杜春雷, 王永茹, 白临波, 邓启凌, 陈波, 郭履容, 袁景和. Profile Control of Continuous Relief MOE in Photoresist[J]. Acta Optica Sinica, 2000, 20(5): 691.

连续微光学元件在光刻胶上的面形控制

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