光学学报, 2017, 37 (10): 1012006, 网络出版: 2018-09-07
用于扫描干涉场曝光的超精密微动台设计与控制 下载: 821次
Design and Control of Ultra-Precision Fine Positioning Stage for Scanning Beam Interference Lithography
补充材料
鲁森, 杨开明, 朱煜, 王磊杰, 张鸣, 杨进. 用于扫描干涉场曝光的超精密微动台设计与控制[J]. 光学学报, 2017, 37(10): 1012006. Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang, Jin Yang. Design and Control of Ultra-Precision Fine Positioning Stage for Scanning Beam Interference Lithography[J]. Acta Optica Sinica, 2017, 37(10): 1012006.