基于塔尔博特自成像光刻机的照明系统设计与分析

佟军民; 刘俊伯; 胡松

doi:doi:10.3788/lop54.082201

激光与光电子学进展, 2017, 54 (8): 082201, 网络出版: 2017-08-02

基于塔尔博特自成像光刻机的照明系统设计与分析下载： 1202次

Design and Analysis of Illumination System of Talbot Self-Imaging Lithographic Equipment

论文大纲

佟军民 ^1,2,*刘俊伯 ²胡松 ²

作者单位

¹ 许昌职业技术学院, 河南许昌 461000

² 中国科学院光电技术研究所, 四川成都 610209

光学设计光刻照明系统容差分析塔尔博特自成像 optical design lithography illumination system tolerance analysis Talbot self-imaging

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摘要

针对塔尔博特自成像光刻机对照明系统的特定需求, 基于成像照明光学设计理论,引入非成像光学理论思想, 建立照明系统的初始结构。利用光学设计软件Zemax对照明系统光学初始结构进行优化, 并在Lighttools中对该照明系统进行建模和大规模分布式光线追迹。追迹结果表明, 在照明面积60 mm×60 mm范围内, 照明不均匀度约为1.83%, 照明功率密度不小于1.15 mW·mm-2。对照明面在光轴方向上的位移容差进行分析, 结果表明该照明系统可以满足塔尔博特自成像光刻的需求。

Abstract

Based on optical design theory of imaging illumination and non-imaging optical theory, an initial optical structure of illumination system is established according to the special requirements of Talbot self-imaging lithographic equipment. The optical design software Zemax is applied to optimize the initial structure. The software Lighttools is used to set up models and perform large-scale ray tracing. The simulation result shows that the nonuniformity of illumination approaches 1.83% in the illumination area of 60 mm×60 mm. Meanwhile, the power density is no less than 1.15 mW·mm-2. The tolerance analysis is carried out on the illumination system. The results show that the illumination system satisfies the demand of Talbot self-imaging lithography.

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佟军民, 刘俊伯, 胡松. 基于塔尔博特自成像光刻机的照明系统设计与分析[J]. 激光与光电子学进展, 2017, 54(8): 082201. Tong Junmin, Liu Junbo, Hu Song. Design and Analysis of Illumination System of Talbot Self-Imaging Lithographic Equipment[J]. Laser & Optoelectronics Progress, 2017, 54(8): 082201.

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