激光与光电子学进展, 2003, 40 (5): 14, 网络出版: 2006-06-27   

步进扫描投影光刻机工件台和掩模台的进展 下载: 903次

Proress of Wafer Stage and Reticle Stage for Step-and-Scan-Lithography System
作者单位
中国科学院上海光学精密机械研究所,上海,201800
摘要
着重介绍了当前国外步进扫描投影光刻机的工件台和掩模台的发展状况,并对套刻精度和整机精度进行了分析.
Abstract
Recent progress in technology of wafer stage and reticle stage used in step-and-scan lithography system is introduced, and the overlay accuracy and the accuracy of the overall system are analyzed.
参考文献

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刘丹, 程兆谷, 高海军, 黄惠杰, 赵全忠, 谌巍. 步进扫描投影光刻机工件台和掩模台的进展[J]. 激光与光电子学进展, 2003, 40(5): 14. 刘丹, 程兆谷, 高海军, 黄惠杰, 赵全忠, 谌巍. Proress of Wafer Stage and Reticle Stage for Step-and-Scan-Lithography System[J]. Laser & Optoelectronics Progress, 2003, 40(5): 14.

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