中国激光, 2012, 39 (9): 0909001, 网络出版: 2012-07-04
基于等效叠栅的反射式光刻对准模型研究
Alignment Scheme Research Based on Equivalent Overlapped Gratings for Reflective Lithography Alignment
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朱江平, 胡松, 于军胜, 唐燕, 周绍林, 刘旗, 何渝. 基于等效叠栅的反射式光刻对准模型研究[J]. 中国激光, 2012, 39(9): 0909001. Zhu Jiangping, Hu Song, Yu Junsheng, Tang Yan, Zhou Shaolin, Liu Qi, He Yu. Alignment Scheme Research Based on Equivalent Overlapped Gratings for Reflective Lithography Alignment[J]. Chinese Journal of Lasers, 2012, 39(9): 0909001.