量子电子学报, 2014, 31 (1): 1, 网络出版: 2014-02-26
应用于极紫外光刻系统多层膜的研究进展
Recent advances in multilayer coatings for extreme ultraviolet lithography
引用该论文
秦娟娟, 董伟伟, 周曙, 游利兵, 方晓东. 应用于极紫外光刻系统多层膜的研究进展[J]. 量子电子学报, 2014, 31(1): 1.
QIN Juan-juan, DONG Wei-wei, ZHOU Shu, YOU Li-bing, FANG Xiao-dong. Recent advances in multilayer coatings for extreme ultraviolet lithography[J]. Chinese Journal of Quantum Electronics, 2014, 31(1): 1.
秦娟娟, 董伟伟, 周曙, 游利兵, 方晓东. 应用于极紫外光刻系统多层膜的研究进展[J]. 量子电子学报, 2014, 31(1): 1. QIN Juan-juan, DONG Wei-wei, ZHOU Shu, YOU Li-bing, FANG Xiao-dong. Recent advances in multilayer coatings for extreme ultraviolet lithography[J]. Chinese Journal of Quantum Electronics, 2014, 31(1): 1.