应用于极紫外光刻系统多层膜的研究进展
秦娟娟, 董伟伟, 周曙, 游利兵, 方晓东. 应用于极紫外光刻系统多层膜的研究进展[J]. 量子电子学报, 2014, 31(1): 1.
QIN Juan-juan, DONG Wei-wei, ZHOU Shu, YOU Li-bing, FANG Xiao-dong. Recent advances in multilayer coatings for extreme ultraviolet lithography[J]. Chinese Journal of Quantum Electronics, 2014, 31(1): 1.
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秦娟娟, 董伟伟, 周曙, 游利兵, 方晓东. 应用于极紫外光刻系统多层膜的研究进展[J]. 量子电子学报, 2014, 31(1): 1. QIN Juan-juan, DONG Wei-wei, ZHOU Shu, YOU Li-bing, FANG Xiao-dong. Recent advances in multilayer coatings for extreme ultraviolet lithography[J]. Chinese Journal of Quantum Electronics, 2014, 31(1): 1.