中国光学, 2012, 5 (4): 401, 网络出版: 2012-08-15   

光刻投影物镜可变光阑的结构设计与分析

Design and analysis of iris diaphragm structure in lithographic projection objective
作者单位
中国科学院 长春光学精密机械与物理研究所 应用光学国家重点实验室, 吉林 长春 130033
摘要
针对光刻机投影物镜的可变光阑设计对光阑调整范围、安装空间、调整精度的要求, 设计了口径为236 mm、调整精度为NA±0003的连续可变光阑。通过设计与计算236 nm光阑片参数, 得到了光阑各组件的结构参数, 并采用部分齿轮减小了运动机构的质量和摩擦。为了保证光阑的调整精度和材料应力要求, 对光阑的各个部件进行强度校验并对其固有频率进行了分析。结果表明: 光阑的关键受力部件(如连接铆钉及传动齿轮)的应力均满足要求, 光阑片的固有频率间不存在密频现象。结果证明了提出结构的合理性。
Abstract
The diaphragm structure in a lithographic projection objective is designed depending on the character demand for large adjustable ranges, small installing spaces and high adjustable precision, and the iris diaphragm has an aperture of 236 mm and adjustable precision of NA±0003. The parameters of the iris piece are calculated in detail and the size of part is acquired. Then, the part of gear is used to reduce the mass and motion friction of the motion structure and the strength of parts such as the rivet and gears is checked to ensure the adjustable precision and material stress of the diaphragm. It is shown that the stress of all of key parts of the diaphragm meets the requirement of the system and the nature frequency of the diaphragm is no dense frequency phenomenon. These results prove the rationality of the proposed structure.
参考文献

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孙振, 巩岩. 光刻投影物镜可变光阑的结构设计与分析[J]. 中国光学, 2012, 5(4): 401. SUN Zhen, GONG Yan. Design and analysis of iris diaphragm structure in lithographic projection objective[J]. Chinese Optics, 2012, 5(4): 401.

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