金刚石线锯切割多晶硅片表面特性与酸刻蚀制绒问题
[1] CAI E, TANG B, FAHRNER W R, et al. Characterization of the surfaces generated by diamond cutting of crystalline silicon [C].Conference and Exhibition 2011, Hamburg, Germany, 2011: 1884-1886.
[2] CHEN C C A, CHAO P H. Surface texture analysis of fixed and free abrasive machining of silicon substrates for solar cells[J]. Advanced Materials Research, 2010, 126: 177-180.
[3] 杜红文,席珍强. 固结磨粒金刚石线锯技术的研究[J]. 现代制造工程, 2010,6: 99-101.
DU Hong-wen, XI Zhen-qiang. The research of fixed abrasive diamond wire saw technology[J].Modern Manufacturing Engineering, 2010, 6: 99-101.
[4] 蔡二辉,汤斌兵, 周剑, 等. 晶体 Si 片切割表面损伤及其对电学性能的影响[J]. 半导体技术,2011, 36(8): 614-618.
CAI Er-hui, Tang Bin-bing, ZHOU Jian, et al. Surface damage of crystalline silicon wafers and their effects on electrical properties[J]. Semiconductor Technology, 2011, 36(8): 614-618.
[5] WATANABE N, KONDO Y, ZDE D. Characterization of polycrystalline silicon wafers for solar cells sliced with novel fixed-abrasive wire[J]. Progress in Photovoltaics: Research and Applications, 2010, 18(7): 485-490.
[6] HOLT A, THOGERSEN A, ROHR C, et al. Surface structure of mono-crystalline silicon wafers produced by diamond wire sawing and by standard slurry sawing before and after etching in alkaline solutions[C]. In Photovoltaic Specialists Conference, 35th IEEE, 2010.
[7] YU X, WANG P, LI X, et al, Thin Czochralski silicon solar cells based on diamond wire sawing technology[J]. Solar Energy Materials and Solar Cells, 2011, 98: 337-342.
[8] 蔡二辉, 晶体硅的金刚石线锯切割性能研究[D]. 南昌: 南昌大学,2011.
CAI Er-hui. Study on the performance of diamond wire saw cutting of crystalline silicon[D]. Nanchang: Nanchang University.
[9] BIDIVILLE A, WASMER K, KRAFT R, et al. Diamond wire-sawn silicon wafers-from the lab to the cell production[C]. 24th European Photovolatic Solar Energy Coference And Exhibition, 2009.
[10] MEINEL B, KOSCHWITZ T, ACKER J. Textural development of SiC and diamond wire sawed sc-silicon wafer[J]. Energy Procedia, 2012, 27: 330-336.
[11] XIAO G E. Electrochemistry of silicon and its oxide[M].New York: Kluwer Academic/Plenum Publisher, 2001: 245-259.
[12] 徐华天,冯仕猛, 单以洪, 等. 多晶硅表面暗纹的形成以及消除技术研究[J]. 半导体光电, 2012,33(5): 690-693+714.
[13] 张发云, 叶建雄.多晶硅表面酸腐蚀制备绒面研究[J]. 光子学报, 2011,40(2): 222-226.
[14] 滕繁,刘志凌, 彭欢, 等.酸腐蚀多晶硅表面的光反射率计算[J]. 太阳能学报, 2009, 30(10): 1039-1042.
TENG Fan, LIU Zhi-ling, PENG Huan, et al. Light reflectivity calculation of acid corrosion surface of multicrystalline silicon[J]. Acta Energiae Solaris Sinica, 2009, 30(10): 1039-1042.
刘小梅, 李妙, 陈文浩, 周浪. 金刚石线锯切割多晶硅片表面特性与酸刻蚀制绒问题[J]. 光子学报, 2014, 43(8): 0816001. LIU Xiao-mei, LI Miao, CHEN Wen-hao, ZHOU Lang. The Surface Characteristics of Diamond Wire Sawn Multicrystalline Silicon Wafers and Their Acidic Texturization[J]. ACTA PHOTONICA SINICA, 2014, 43(8): 0816001.