红外与毫米波学报, 2004, 23 (4): 313, 网络出版: 2006-05-10   

溅射沉积功率对PZT薄膜的组分、结构和性能的影响

INFLUENCE OF DEPOSITION POWER ON THE COMPOSITION,STRUCTURE AND PROPERTIES OF PZT THIN FILMS PREPARED BY RF SPUTTERING
作者单位
1 南昌大学,物理系,江西,南昌,330047
2 中国科学院上海技术物理研究所,红外物理国家重点实验室,上海,200083
摘要
用射频(RF)溅射法在镀LaNiO3(LNO)底电极的Si片上沉积PbZr0.52Ti0.48O3(PZT)铁电薄膜,沉积过程中基底温度为370℃,然后在大气环境中对沉积的PZT薄膜样品进行快速热退火处理(650℃,5min).用电感耦合等离子体发射光谱(ICP-AES)测量其组分,X射线衍射(XRD)分析PZT薄膜的结晶结构和取向,扫描电子显微镜(SEM)分析薄膜的表面形貌和微结果,RT66A标准铁电综合测试系统分析Pt/PZT/LNO电容器的铁电与介质特性,结果表明,PZT薄膜的组分、结构和性能都与溅射沉积功率有关.
Abstract
PbZr0.52Ti0.48O3(PZT) ferroelectric thin films were deposited on LaNiO3 coated p-Si(111) substrates by RF magnetron sputtering at low substrate temperature( T =370℃) with deposition power ranging from 60W to 120W, sequentially followed by a rapid thermal annealing(RTA) process at temperature 650℃ for 5 minutes. The crystalline phase, microstructure, composition, and electrical properties of PZT thin films were investigated by X-ray diffraction(XRD), canning electron microscope(SEM), inductively coupled plasma-atom emission spectrometry (ICP-AES), four-probe meter and spectro-ellipsometer, respectively. It is found that the microstructure, composition and electrical properties of sputtered PZT thin films are highly dependent on the deposition power, i.e., the atom rate Pb(Zr+Ti) of PZT films and the leak-current of Pt/PZT/LNO capacitors increase as the deposition power increases, films deposited at low power are Pb-poor and present nonferroelectricity, while those deposited at high power are Pb-rich.Optimized deposition power is 80W.
参考文献

[1] . et al. Structure and electrical properties of Pb(ZrxTi1-x)O3 deposited on textured Pt films[J]. J.Appl.Phys., 2001, 90(4): 1962-1967.

[2] . Low temperature crystallization of lead zirconate titanate thin films by a sol-gel method[J]. J.Appl.Phys., 1999, 85: 7355-7359.

[3] . et al. Lowing of crystallization temperature of sol-gel derived Pb(Zr,Ti)O3 thin films[J]. Integrated Ferroelectrics, 2000, 30: 193-202.

[4] . Analytaical transmission electron microscopy of hydrogen-induced degradation in ferroelectric Pb(Zr,Ti)O3 on a Pt electrodes[J]. Appl.Phys.Lett., 1998, 73(14): 1955-1557.

[5] . Microstructural and electrical properties of Pb(Zr0.52Ti0.48)O3 films grown on p-InSb(111) substrate at low temperatue[J]. J.Phys.and Chem.of Solids, 2000, 61: 529-535.

[6] . Improment on ferroelectric properties of metal-organic decomposited PZT thin film prepared by using prenucleation layer[J]. Integrated Ferroelectrics, 2000, 30: 157-164.

[7] . et al. Effect of substrate material on the crystallinity and epitaxy of Pb(Zr,Ti)O3 thin films[J]. Thin Solid Films, 1999, 347: 106-111.

[8] . Influnce of contact electrodes on leakage characteristics in ferroelectric thin films[J]. J.Appl.Phys., 2001, 90(1): 375-382.

[9] . Effect of textured LaNiO3 electrode on the fatigue improvement of Pb(Zr0.53Ti0.47)O3 thin films[J]. Appl.Phys.Lett., 1996, 68(10): 1430-1432.

[10] Chao G C, Wu J M. Leakage current and fatigue properties of Pb(Zr, Ti) O3 electrodes[J]. Jpn.J.Appl.Phys., 2001, 40(4A): 2417-2422.

[11] . Sun J L. et al. Growth of(100)-oriented LaNiO3 thin films directly on Si substrate by a simple metalorganic decomposition technique for the highly oriented PZT thin films[J]. J.Cryst.Growth, 2000, 220: 100-104.

李新曦, 赖珍荃, 王根水, 孙璟兰, 赵强, 褚君浩. 溅射沉积功率对PZT薄膜的组分、结构和性能的影响[J]. 红外与毫米波学报, 2004, 23(4): 313. 李新曦, 赖珍荃, 王根水, 孙璟兰, 赵强, 褚君浩. INFLUENCE OF DEPOSITION POWER ON THE COMPOSITION,STRUCTURE AND PROPERTIES OF PZT THIN FILMS PREPARED BY RF SPUTTERING[J]. Journal of Infrared and Millimeter Waves, 2004, 23(4): 313.

本文已被 2 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!