发光学报, 2011, 32 (4): 363, 网络出版: 2011-04-28   

利用MOCVD在r面蓝宝石上生长的a面GaN中两步AlN缓冲层的优化

Optimization of Two-step AlN Buffer of a-plane GaN Films Grown on r-plane Sapphire by MOCVD
作者单位
中国科学院物理研究所 凝聚态国家重点实验室, 北京 100190
引用该论文

何涛, 陈耀, 李辉, 戴隆贵, 王小丽, 徐培强, 王文新, 陈弘. 利用MOCVD在r面蓝宝石上生长的a面GaN中两步AlN缓冲层的优化[J]. 发光学报, 2011, 32(4): 363.

HE Tao, CHEN Yao, LI Hui, DAI Long-gui, WANG Xiao-li, XU Pei-qiang, WANG Wen-xin, CHEN Hong. Optimization of Two-step AlN Buffer of a-plane GaN Films Grown on r-plane Sapphire by MOCVD[J]. Chinese Journal of Luminescence, 2011, 32(4): 363.

参考文献

[1] Nakamura S. The role of structural imperfections in InGaN-based blue light-emitting diodes and Laser diodes [J]. Science, 1998, 281(5379):956-961.

[2] Asif Khan M, Bhattarai A, Kuznia J N, et al. High electron mobility transistor based on a GaN-AlxGa1-xN heterojunction [J]. Appl. Phys. Lett., 1993, 63(9):1214-1215.

[3] Morkoc H, Strite S, Gao G B, et al. Large-band-gap SiC, Ⅲ-Ⅴ nitride, and Ⅱ-Ⅵ ZnSe-based semiconductor device technologies [J]. J. Appl. Phys., 1994, 76(3):1363-1398.

[4] Nakamura S, Senoh M, Mukai T. Highly p-typed Mg-doped GaN films grown with GaN buffer layers [J]. Jpn. J. Appl. Phys. Part 2, 1991, 30(10A):L1708-L1711.

[5] Wang Mingyue, Yuan Jinshe, Yu Guohao. Correlation of the yellow photoluminescence and excitation sources of GaN film grown by MOCVD [J]. Chin. J. Lumin. (发光学报), 2009, 30(1):73-76 (in Chinese).

[6] Wu Dianzhong, Wang Wenxin, Yang Chengliang, et al. InAs quantum dots with InGaAs Caplayer infrred detector grown by MBE [J]. Chin. J. Lumin. (发光学报), 2009, 30(2):209-213 (in Chinese).

[7] Yang Chenliang, Ye Huiqi, Wang Wenxin, et al. Effect of interface growth interruption on spin relaxation in GaAs(Ⅲ)-AlGaAs/GaAs quantum wells [J]. Chin. J. Lumin. (发光学报), 2009, 30(2):214-218 (in Chinese).

[8] Xing Bing, Cao Wenyu, Du Weimin. Temperature-dependent PL of InGaN/GaN multiple quantum wells with variable content of In [J]. Chin. J. Lumin. (发光学报), 2010, 31(6):864-869 (in Chinese).

[9] Im J S, Kollmer H, Off J, et al. Reduction of oscillator strength due to piezoelectric fields in GaN/AlxGa1-xN quantum wells [J]. Phys. Rev. B, 1998, 57(16):R9435-R9438.

[10] Langer R, Simon J, Ortiz V, et al. Giant electric fields in unstrained GaN single quantum wells [J]. Appl. Phys. Lett., 1999, 74(25):3827-3829.

[11] Lefebvre P, Morel A, Gallart M, et al. High internal electric field in a graded-width InGaN/GaN quantum well: accurate determination by time-resolved photoluminescence spectroscopy [J]. Appl. Phys. Lett., 2001, 78(9):1252-1254.

[12] Bernardini F, Fiorentini V. Macroscopic polarization and band offsets at nitride heterojunctions [J]. Phys. Rev. B, 1998, 57(16):R9427-R9430.

[13] Li D S, Chen H, Yu H B, et al. Anisotropy of a-plane GaN grown on r-plane sapphire by metalorganic chemical vapor deposition [J]. J. Cryst. Growth, 2004, 265(1-2):107-110.

[14] Yan J F, Guo L W, Zhang J, et al. Characteristics of the improved a-plane GaN films grown on r-plane sapphire with two-step AlN buffer layer [J]. J. Cryst. Growth, 2007, 307(1):35-39.

[15] Wang H M, Chen C Q, Gong Z, et al. Anisotropic structural characteristics of (1120) GaN templates and coalesced epitaxial lateral overgrown films deposited on (1012 ) sapphire [J]. Appl. Phys. Lett., 2004, 84(4):499-501.

[16] Hiramatsu K, Nishiyama K, Motogaito A, et al. Recent progress in selective area growth and epitaxial lateral overgrowth of Ⅲ-nitrides:effects of reactor pressure in MOVPE growth [J]. Phys. Stat. Sol. (a), 1999, 176(1):535-543.

[17] Araki M, Mochimizo N, Hoshino K, et al. Direct growth of a-plane GaN on r-plane sapphire substrate by metalorganic vapor phase epitaxy [J]. Jpn. J. Appl. Phys., 2007, 46(2):555-559.

[18] Ni X, Fu Y, Moon Y T, et al. Optimization of (1120) a-plane GaN growth by MOCVD on (1102) r-plane sapphire [J]. J. Cryst. Growth, 2006, 290(1):166-170.

[19] Hollander, J H, Kappers M J, McAleese C, et al. Improvements in a-plane GaN crystal quality by a two-step growth process [J]. Appl. Phys. Lett., 2008, 92(10):101104-1-3.

[20] Craven M D, Lim S H, Wu F, et al. Structural characterization of nonpolar (1120) a-plane GaN thin films grown on (1102) r-plane sapphire [J]. Appl. Phys. Lett., 2002, 81(3):469-471.

[21] Paskov P P, Schifano R, Monemar B. Emission properties of a-plane GaN grown by metal-organic chemical-vapor deposition [J]. J. Appl. Phys., 2005, 98(9):093519-1-7.

[22] Liu R, Bell A, Ponce F A, et al. Luminescence from stacking faults in gallium nitride [J]. Appl. Phys. Lett., 2005, 86(2):021908-1-3.

[23] Netzela C, Wernickea T, Zeimera U, et al. Near band edge and defect emissions from epitaxial lateral overgrown a-plane GaN with different stripe orientations [J]. J. Cryst. Growth, 2008, 310(1):8-12.

何涛, 陈耀, 李辉, 戴隆贵, 王小丽, 徐培强, 王文新, 陈弘. 利用MOCVD在r面蓝宝石上生长的a面GaN中两步AlN缓冲层的优化[J]. 发光学报, 2011, 32(4): 363. HE Tao, CHEN Yao, LI Hui, DAI Long-gui, WANG Xiao-li, XU Pei-qiang, WANG Wen-xin, CHEN Hong. Optimization of Two-step AlN Buffer of a-plane GaN Films Grown on r-plane Sapphire by MOCVD[J]. Chinese Journal of Luminescence, 2011, 32(4): 363.

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