为提升光学镜头的成像质量，消除杂散光的影响，以K9玻璃为基底设计可见光波段平均反射率小于0.1%的减反射膜。采用电子束离子辅助沉积的制备方式，针对薄层敏感度高、光谱变化大等问题，通过建立稳定控制膜层厚度的数学模型来减小膜厚误差，提高制备精度和成膜稳定性。对减反射膜进行环测实验，优化调整工艺参数，侧重提高减反射膜的硬度和耐水煮能力。实验结果表明，最终制备出的减反射膜在420~680 nm波段内的平均反射率约为0.044%，最高反射率为0.071 2%，克服了以MgF₂为外层的减反射膜机械性能和化学稳定性较差的问题，满足工程应用低损耗、稳定可靠、高强度、可重复性制备的要求。

To improve the imaging quality of optical lenses and eliminate the influence of stray light， an antireflective film with an average reflectance of less than 0.1% in the visible wavelength range was designed on a K9 glass substrate. Using electron beam evaporation as the preparation method， to address the issues of high sensitivity and large spectral changes in thin films， a mathematical model was established to stabilize the control of film thickness， reduce film thickness errors， improve preparation accuracy， and film formation stability. Environmental testing experiments were conducted on the antireflective film， in which the process parameters were continuously optimized and adjusted， with a focus on improving the hardness and water boiling resistance of the antireflective film. The experimental results show that the average reflectance of the prepared antireflective film is approximately 0.044% and the highest reflectance is 0.071 2% in the band range of 420-680 nm. Thus， problems caused by the poor mechanical properties and chemical stability of the antireflective film with MgF₂ as the outer layer are overcome. Further， the developed film meets the requirements of low loss， stability， reliability， high strength， and repeatable preparation in engineering applications.