同轴两反式高NA投影光刻物镜热像差补偿方法研究

热像差是导致光刻物镜工作状态下像质劣化的主要原因之一。针对同轴两反式高数值孔径(NA)投影光刻物镜的结构特点，提出了将元件位移法和元件分区加热法相结合，共同补偿热像差的方案。元件位移法通过改变元件的间隔、偏心或倾斜量来调节像质；元件分区加热法利用光学材料折射率随温度变化的特点，通过控制元件的温度分布产生可控波前。采用上述补偿方案对偶极照明模式下的热像差进行补偿，波像差从129.78 nm 减小至1.69 nm，畸变从12.24 nm 减小至1.31 nm，将物镜像质补偿至接近设计水平。

Abstract

Thermal aberration is one of the main reasons for imaging quality degradation of lithographic lens in working status. According to the structure feature of on-axis two-mirror high numerical aperture (NA)lithographic lens, a combination of element position shift and district heating method is proposed to compensate thermal aberration. The element position shift method takes advantage of element space, decentration and tilt to adjust the imaging quality; the district heating method takes advantage of the feature that the refractive index of optical material changes along with the temperature to control the temperature distribution on the lens and generate a controllable wavefront. The thermal aberration under dipole illumination model is compensated by the proposed method, and the wavefront aberration and distortion are recovered from 129.78 nm and 12.24 nm to 1.69 nm and 1.31 nm, respectively. The proposed method can basically recover the imaging quality of lens to design level.

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徐象如, 黄玮, 贾树强, 徐明飞. 同轴两反式高NA投影光刻物镜热像差补偿方法研究[J]. 光学学报, 2015, 35(10): 1011003. Xu Xiangru, Huang Wei, Jia Shuqiang, Xu Mingfei. Compensation Method of Thermal Aberration for On-Axis Two-Mirror High NA lithographic Lens[J]. Acta Optica Sinica, 2015, 35(10): 1011003.

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