1 长春理工大学 理学院 高功率半导体激光国家重点实验室, 长春 130022
2 中国科学院苏州纳米技术与纳米仿生研究所, 江苏 苏州 215123
针对光学倒锥窄尖的制备工艺困难的问题，通过特殊设计掩膜版，利用步进式光刻机，经过一次步进，对光刻胶进行两次连续的图案化处理，突破紫外光刻机的分辨率极限，制备出尖端接近50 nm的倒锥结构图案.再对光刻胶进行回流处理，解决其分层的问题，保证了结构侧壁的光滑度及尖端的完整性.在深硅刻蚀工艺中，通过对刻蚀中各气体组分进行调整，改善了锥形结构表面形貌，使结构的均匀性和完整性得到提升.最终得到了适用于层间耦合的尖端接近50 nm的光学倒锥.
光学倒锥 层间耦合 步进式光刻 光刻胶回流 刻蚀工艺 Optical inverted taper Interlayer coupling Step lithography Photoresist reflow Etching process 光子学报
2019, 48(12): 1223003
1 长春理工大学 理学院 高功率半导体激光国家重点实验室, 长春 130022
2 中国科学院苏州纳米技术与纳米仿生研究所, 江苏 苏州 215123
采用步进投影式光刻机的步进原理控制曝光剂量, 制备楔形模斑转换器.分析了不同曝光剂量对侧壁形貌的影响以及最佳的刻蚀参数.实验结果表明: 最佳曝光时间为20 ms/次, 回流温度为160℃, 时间为1 min, 当刻蚀气体及比例为SF6∶He=8∶80时, 刻蚀后得到满足需求的样品,且制备方式制作周期短, 精度高, 与电子束灰度曝光方法相比, 具有高效率、低成本等优点.
楔形 模斑转换器 步进式曝光 灰度 刻蚀工艺 Wedge-shaped Mode size converter Stepper exposure Gray scale Etching process
1 苏州大学 物理科学与技术学院，江苏 苏州 215006
2 中国科学院 苏州纳米技术与纳米仿生研究所，江苏 苏州 215125
基于数字微反射镜的动态掩膜面投影微立体光刻技术是一种基于快速原型制造思想的新型微细结构加工手段，其系统中常用树脂槽和涂覆装置使得其无法适用于粘度大的固化材料。为实现粘度大的复合纳米材料的固化制造，构建了新型的基于数字微反射镜技术的动态掩膜微立体光刻系统，该系统的加工横向分辨率由系统的光学分辨率与树脂特性共同决定。当单层树脂固化厚度超过临界值时，系统的横向分辨率将降低。根据实验中测量光学系统的分辨率以及树脂的工作曲线，得到本系统的最高横向分辨率可以达到14 μm。
微立体光刻 分辨率 树脂化学响应 临界调制传递函数 micro-stereo-lithography resolution chemical response of resin critical modulation transfer function
Author Affiliations
Abstract
1 Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 Graduate University of Chinese Academy of Sciences, Beijing 100049, China
Using the effective medium theory and the waveguide eigenvalue equation, we design a multimode planar periodic waveguide. When a plane wave illuminates the grating at the designed angle and wavelength, more than one leaky modes are excited coincidentally. Then the reflection efficiency around this designed angle and wavelength is investigated using a rigorous coupled wave analysis formulation and a gap of reflection peaks is found. Electric field distributions reveal that this high reflectivity gap is due to the coupling between these two coincidentally excited leaky modes.
导模共振 严格耦合波理论 泄露模 050.6624 Subwavelength structures 230.7408 Wavelength filtering devices 260.5740 Resonance Chinese Optics Letters
2010, 8(6): 557
Author Affiliations
Abstract
1 Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 Graduate University of Chinese Academy of Sciences, Beijing 100049, China
A guided-mode resonance (GMR) filter with the same material (Ta2O5) for both the grating layer and the waveguide layer is designed and fabricated. This simple structure is easy to fabricate and can avoid the defects at the grating/waveguide interface using different materials. The spectral response measured with a Lambda 900 spectrophotometer under normal incidence for TE waves exhibits a peak reflectance exceeding 80% at the wavelength of 1040 nm with a full-width half-maximum (FWHM) linewidth of 23 nm. We evaluate the deviations of the fabricated structure from the designed parameters.
导模共振、滤光片、离子束旋转刻蚀 050.1950 Diffraction gratings 310.2790 Guided waves 230.7408 Wavelength filtering devices 310.6860 Thin films, optical properties Chinese Optics Letters
2010, 8(5): 447
