光刻技术在前沿科学与国计民生等领域发挥着重要作用。随着曝光光源、数字微镜器件（DMD）、投影镜头等光学元件的升级及计算机控制技术的飞速发展，基于DMD的无掩模光刻技术有可能在不久的将来与目前成熟的有掩模光刻技术齐头并进，并在特定应用领域中不可或缺。详细介绍了基于DMD的面投影光刻的曝光原理、系统组成和发展进程，重点介绍了提高面投影光刻分辨率的方法，以及突破光学衍射极限制备超细微结构的相关工作。同时阐述了基于DMD的面投影无掩模曝光技术在制备光子学器件、生物学支架、仿生结构等器件中的独特优势，特别是引入超快激光后其在新型加工领域所展现出的应用潜力。

Lithography technology plays an important role in frontier science and national economy and people’s livelihood. With the optimization of optical components such as the exposure light source, digital micromirror device, projection lens and the rapid development of computer control technology, maskless lithography technology based on digital micromirror devices may go hand in hand with the existing well-developed masked lithography technology in the near future, and it will be quite indispensable in certain application fields. In this paper, we introduce the exposure principle, system composition and development history of optical projection lithography based on digital micromirror devices in detail, and we emphasize the strategy for improving the projection lithography resolution as well as achieving ultrafine structures by breaking the optical diffraction limit. Meanwhile, we put forward the unique advantages of projection maskless exposure technology based on digital micromirror devices in achieving micro devices including photonics devices, biological scaffolds and bionic structures, especially its potential applications in novel processing fields by utilizing ultrafast laser.