基于干涉的同轴检焦新方法
[1] 姚汉民, 胡松, 邢廷文. 光学投影曝光微纳加工技术[M]. 北京: 北京工业大学出版社, 2006. 60-80.
Yao Hanmin, Hu Song, Xing Tingwen. Optical Projection Lithography Micromachining Technology[M]. Beijing: Beijing University of Technology Press, 2006. 60-80.
[2] 曾爱军,王向朝, 徐德衍. 投影光刻机调焦调平传感技术的研究进展[J]. 激光与光电子学进展, 2006, 41(7): 24-30.
Zeng Aijun, Wang Xiangchao, Xu Deyan. Progess in focus and level sensor for projection lithography system[J]. Laser & Optoelectronics Progress, 2006, 41(7): 24-30.
[3] Van Der Werf, J E. Optical focus and level sensor for wafer steppers[J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992, 10(2): 735-740.
[4] Y Oshida, M Tanaka, T Tanimoto, et al.. Chip leveling and focusing with laser interferometry[C]. SPIE, 1990, 1264: 244-251.
[5] M Watanabe, Y Oshida, Y Nakayama, et al.. Focusing and leveling based on wafer surface profile detection with interferometry for optical lithography[C]. SPIE, 1994, 2197: 980-989.
[6] W Yan, Y Yang, W F Chen, et al.. Moiré-based focusing and leveling scheme for optical projection lithography[J]. Appl Opt, 2010, 49(31): 5959-5963.
[7] X Z Dong, Z S Zhao, X M Duan. Improving spatial resolution and reducing aspect ratio in multiphoton polymerization nanofabrication[J]. Appl Phys Lett, 2008, 92(9): 091113.
[8] 苏显渝, 李继陶. 信息光学[M]. 四川: 四川大学出版社, 1995. 300-310.
Su Xianyu, Li Jitao. Information Optics[M]. Sichuan: Sichuan University Press, 1995. 300-310.
[9] 钱晓凡, 饶帆, 李兴华, 等. 精确最小二乘相位解包裹算法[J]. 中国激光, 2012, 39(2): 0209001.
[10] 孟晓辰, 郝群, 朱秋东, 等. 干涉条纹空间频率对数字叠栅移相干涉测量精度的影响[J]. 中国激光, 2011, 38(10): 1008008.
李光, 朱江平, 陈铭勇, 赵立新, 胡松, 段宣明. 基于干涉的同轴检焦新方法[J]. 中国激光, 2013, 40(12): 1208005. Li Guang, Zhu Jiangping, Chen Mingyong, Zhao Lixin, Hu Song, Duan Xuanming. Novel Coaxial Focusing Method Based on Interference[J]. Chinese Journal of Lasers, 2013, 40(12): 1208005.