Author Affiliations
Abstract
1 Ningbo Institute of Materials Technology and Engineering, Ningbo 315201, China
2 University of Chinese Academy of Sciences, Beijing 100049, China
AlGaN-based light-emitting diodes (LEDs) on offcut substrates enhance radiative emission via forming carrier localization centers in multiple quantum wells (MQWs). This study introduces the carrier transport barrier concept, accessing its impact on the quantum efficiency of LEDs grown on different offcut sapphire substrates. A significantly enhanced internal quantum efficiency (IQE) of 83.1% is obtained from MQWs on the 1° offcut sapphire, almost twice that of the controlled 0.2° offcut sample. Yet, 1° offcut LEDs have higher turn-on voltage and weaker electroluminescence than 0.2° ones. Theoretical calculations demonstrate the existence of a potential barrier on the current path around the step-induced Ga-rich stripes. Ga-rich stripes reduce the turn-on voltage but restrict sufficient driving current, impacting LED performance.
carrier localization step-bunching potential barrier offcut substrate DUV LEDs Chinese Optics Letters
2024, 22(2): 022501
1 中国科学院长春光学精密机械与物理研究所, 发光学及应用国家重点实验室, 长春 130033
2 中国科学院大学, 材料科学与光电工程中心, 北京 100049
本文在具有0.2°至1.0°斜切角的c面蓝宝石衬底上通过金属有机化合物化学气相沉积(MOCVD)生长了台阶聚束表面形貌AlN外延层, 并系统研究了高温退火过程中其表面形貌演化规律, 且基于第一性原理计算揭示了表面形貌演化背后的物理机制。研究发现, 随退火温度逐步升高, AlN外延层台阶边缘首先出现具有六方结构特征的热刻蚀凹坑, 随后在台面上形成边缘规则的多边形凹坑, 其主要原因是AlN表面台阶边缘处Al-N原子对脱附能量(10.72 eV)小于台面处Al-N原子对脱附能量(12.12 eV)。此外, 由于台阶宽度随斜切角增大而变窄, 台面处凹坑在扩张过程中易与台阶边缘处凹坑发生合并形成V形边缘, 斜切角越大台面上凹坑数量越少。本文阐明了不同斜切角蓝宝石衬底上生长的AlN在高温热退火过程中台阶聚束形貌演变机制, 为面内组分调制的AlGaN基高效深紫外LED提供基础。
氮化铝 表面形貌 高温热退火 台阶聚束 斜切衬底 热刻蚀 AlN surface morphology high-temperature anneal step bunching miscut substrate thermal etch
1 Department of Chemical Engineering, University of Utah, Salt Lake City 84112, USA
2 Cao Group, Salt Lake City 84118, USA
3 Huaian College of Information Technology, Huaian 223001, CHN
