首页 > 论文 > 中国激光 > 45卷 > 1期(pp:103002--1)

光刻曝光系统中新型光可变衰减器的研制

Development of a Novel Optical Variable Attenuator in Lithography Exposure System

  • 摘要
  • 论文信息
  • 参考文献
  • 被引情况
  • PDF全文
分享:

摘要

在超大规模集成电路中, 为满足数值孔径为1.35、波长为193 nm的光刻曝光系统45 nm的成像分辨率要求, 设计了一种新型光可变衰减器, 用于控制系统的光能透射率, 调整曝光能量。该衰减器在光入射角为20°~40°时, 衰减面的平均透射率呈线性变化并从95%降低至8%, 同时保证其余三个表面的光能损失均低于1%。设计和制作了光可变衰减器的光学薄膜, 其基底材料选择熔融石英, 膜层材料采用LaF3和AlF3。实验测试了光可变衰减器系统性能, 测试结果显示该系统的光能透射率在8%~90%范围内连续可调, 实验结果满足设计要求。与传统光可变衰减器相比, 该系统可调制衰减范围更大, 衰减量更稳定, 具有一定的应用价值。

Abstract

In order to achieve the imaging resolution of 45 nm with a numerical aperture of 1.35 and a wavelength of 193 nm in the lithography exposure system of ultra-large scale integrated circuits, a novel optical variable attenuator is designed. The device cannot only control the light transmittance, but also adjust the exposure energy. The average transmittance of the attenuation surface decreases from 95% to 8% linearly when the light incidence angle changes from 20° to 40° , and light energy loss of the other three faces are less than 1% in this system. Optical films are designed and fabricated with fused silica as substrate, and LaF3 as well as AlF3 as optical films. Experiments are performed to investigate the attenuator performance, and the results show that the light transmittance is continuously tunable in the range from 8% to 90%, which satisfies the requirements of the system. Compared with traditional optical variable attenuators, the device is with wider attenuation modulation range and more stable attenuation, and it has potential applications.

Newport宣传-MKS新实验室计划
补充资料

中图分类号:O436

DOI:10.3788/cjl201845.0103002

所属栏目:材料与薄膜

基金项目:国家自然科学基金青年基金(61308051)、国家自然科学基金面上项目(91338116)

收稿日期:2017-07-18

修改稿日期:2017-07-31

网络出版日期:--

作者单位    点击查看

李美萱:长春理工大学光电工程学院, 吉林 长春 130022长春理工大学光电信息学院, 吉林 长春 130022
王丽:长春理工大学光电工程学院, 吉林 长春 130022
董连和:长春理工大学光电工程学院, 吉林 长春 130022

联系人作者:李美萱(limeixuannuc@163.com)

备注:李美萱(1984-), 女, 博士研究生, 讲师, 主要从事微结构光学元件与薄膜波导术、光纤通信技术等方面的研究。

【1】Sun J, Shao J D, Yi K, et al. Effects of substrate temperatures on the characterization of magnesium fluoride thin films in deep-ultraviolet region[J]. Applied Optics, 2014, 53(7): 1298-1305.

【2】Guo C, Kong M D, Gao W D, et al. Simultaneous determination of optical constants, thickness, and surface roughness of thin film from spectrophotometric measurements[J]. Optics Letters, 2013, 38(1): 40-42.

【3】Yuan Q Y, Wang X Z, Shi W J, et al. Development of immersion lithography[J]. Laser & Optoelectronics Progress, 2006, 43(8): 13-20.
袁琼雁, 王向朝, 施伟杰, 等. 浸没式光刻技术的研究进展[J]. 激光与光电子学进展, 2006, 43(8): 13-20.

【4】Liu Z T, Zhou J Y, Liu L X, et al. A new PCB digital lithograph projection imaging technology[J]. Laser & Optoelectronics Progress, 2015, 52(4): 042203.
刘志涛, 周金运, 刘丽霞, 等. 一种新型PCB数字光刻投影成像技术[J]. 激光与光电子学进展, 2015, 52(4): 042203.

【5】Liu G H, He H B, Jin Y X, et al. Electron beam evaporated LaF3 thin films prepared by different temperatures and deposition rates[J]. Applied Surface Science, 2010, 256(8): 2343-2346.

【6】Yang M H, Gatto A, Kaiser N. Research and development of VUV optical coatings for micro mirror applications[J]. Optics and Precision Engineering, 2005, 13(4): 465-470.

【7】Jia N N, Deng C L, Pang F F, et al. Research on excimer laser etching technology for achieving optical waveguide end face[J]. Chinese J Lasers, 2015, 42(3): 0303012.
贾娜娜, 邓传鲁, 庞拂飞, 等. 光波导端面的准分子激光刻蚀技术研究[J]. 中国激光, 2015, 42(3): 0303012.

【8】Al-Kuhaili M F, Khawaja E E, Durrani S M A. Determination of the optical constants (n and k) of inhomogeneous thin films with linear index profiles[J]. Applied Optics, 2006, 45(19): 4591-4597.

【9】Hu T G, Wu A Q, Liu Q H. The optical variable attenuators[J]. Study of Optical Communications, 1993(1): 22-26.
胡台光, 吴爱清, 刘秋华. 光可变衰减器[J]. 光通信研究, 1993(1): 22-26.

【10】Cho B, Lyu A, Feldman M. Laser-induced damage resistance of UV coatings on fused silica and CaF2[C]. SPIE, 2012, 8530: 853029.

【11】Liu C D, Kong M D, Guo C, et al. Theoretical design of shadowing masks for uniform coatings on spherical substrates in planetary rotation systems[J]. Optics Express, 2012, 20(21): 23790-23797.

【12】Wang L, Li S K, Wang X Z, et al. Source optimization using particle swarm optimization algorithm in optical lithography[J]. Acta Optica Sinica, 2015, 35(4): 0422002.
王磊, 李思坤, 王向朝, 等. 基于粒子群优化算法的光刻机光源优化方法[J]. 光学学报, 2015, 35(4): 0422002.

【13】Yan G Y, Li S K, Wang X Z. Source optimization method of lithography tools based on quadratic programming[J]. Acta Optica Sinica, 2014, 34(10): 1022004.
闫观勇, 李思坤, 王向朝. 基于二次规划的光刻机光源优化方法[J]. 光学学报, 2014, 34(10): 1022004.

【14】Liu G H, Yu H, Zhang W L, et al. Comparison study of microstructure, chemical composition and optical properties between resistive heating and electron beam evaporated LaF3 thin films[J]. Thin Solid Films, 2011, 519(11): 3487-3491.

【15】Zhang Y, Jin C S, Ma D M, et al. Measuring technology for wavefront aberration of EUVL objective system[J]. Infrared and Laser Engineering, 2012, 41(12): 3384-3389.
张宇, 金春水, 马冬梅, 等. 极紫外光刻物镜系统波像差检测技术研究[J]. 红外与激光工程, 2012, 41(12): 3384-3389.

引用该论文

Li Meixuan,Wang Li,Dong Lianhe. Development of a Novel Optical Variable Attenuator in Lithography Exposure System[J]. Chinese Journal of Lasers, 2018, 45(1): 0103002

李美萱,王丽,董连和. 光刻曝光系统中新型光可变衰减器的研制[J]. 中国激光, 2018, 45(1): 0103002

被引情况

【1】 陈之厦, 梁斌明, 庄松林. 基于二维光子晶体的温控光衰减器. 激光与光电子学进展, 2019, 56(15): 152301--1

【2】 韩雪莹, 王琪, 葛乃馨. 基于调频的相位调制潜像防伪方法. 光学学报, 2019, 39(8): 805001--1

您的浏览器不支持PDF插件,请使用最新的(Chrome/Fire Fox等)浏览器.或者您还可以点击此处下载该论文PDF