基于 HNA溶液腐蚀的微半球谐振陀螺研究进展
[1] 王旭.半球谐振陀螺误差建模补偿与力平衡控制方法研究[D].长沙:国防科学技术大学, 2012. (WANG Xu. Error modeling compensation and forces to rebalance control methods study for hemispherical resonators gyro[D]. Changsha, Hunan,China:National University of Defense Technology, 2012.)
王旭.半球谐振陀螺误差建模补偿与力平衡控制方法研究[D].长沙:国防科学技术大学, 2012. (WANG Xu. Error modeling compensation and forces to rebalance control methods study for hemispherical resonators gyro[D]. Changsha, Hunan,China:National University of Defense Technology, 2012.)
[2] 易剑,江南,庄须叶,等. MEMS固体波动陀螺谐振子现状及发展[J].微纳电子技术, 2018,55(10):738-745. (YI Jian, JIANG Nan,ZHUANG Xuye,et al. Status and development of MEMS solid wave gyroscope resonators[J]. Micronanoelectronic Technology. 2018,55(10):738-745.)
易剑,江南,庄须叶,等. MEMS固体波动陀螺谐振子现状及发展[J].微纳电子技术, 2018,55(10):738-745. (YI Jian, JIANG Nan,ZHUANG Xuye,et al. Status and development of MEMS solid wave gyroscope resonators[J]. Micronanoelectronic Technology. 2018,55(10):738-745.)
[3] 权海洋,杨栓虎,陈效真,等.高端MEMS固体波动陀螺的发展与应用[J].导航与控制, 2017,16(6):76-85. (QUAN Haiyang,YANG Shuanhu,CHEN Xiaozhen,et al. Development and application of advanced MEMS solid wave gyroscope[J]. Navigation and Control, 2017,16(6):76-85.)
权海洋,杨栓虎,陈效真,等.高端MEMS固体波动陀螺的发展与应用[J].导航与控制, 2017,16(6):76-85. (QUAN Haiyang,YANG Shuanhu,CHEN Xiaozhen,et al. Development and application of advanced MEMS solid wave gyroscope[J]. Navigation and Control, 2017,16(6):76-85.)
[4] 汪红兵,林丙涛,梅松,等. 微半球谐振陀螺技术研究进展[J]. 微纳电子技术, 2017,54(11):47-55. (WANG Hongbing,LIN Bingtao,MEI Song,et al. Research development of micro Hemispherical Resonator Gyro(μHRG) technology[J]. Micronanoelectronic Technology, 2017,54(11):47-55.)
汪红兵,林丙涛,梅松,等. 微半球谐振陀螺技术研究进展[J]. 微纳电子技术, 2017,54(11):47-55. (WANG Hongbing,LIN Bingtao,MEI Song,et al. Research development of micro Hemispherical Resonator Gyro(μHRG) technology[J]. Micronanoelectronic Technology, 2017,54(11):47-55.)
[5] NAGOURNEY T,CHO J Y,DARVISHIAN A,et al. Effect of metal annealing on the Q-factor of metal-coated fused silica micro shell resonators[C]// IEEE International Symposium on Inertial Sensors & Systems. Hapuna Beach,HI,USA:IEEE, 2015:13-17.
NAGOURNEY T,CHO J Y,DARVISHIAN A,et al. Effect of metal annealing on the Q-factor of metal-coated fused silica micro shell resonators[C]// IEEE International Symposium on Inertial Sensors & Systems. Hapuna Beach,HI,USA:IEEE, 2015:13-17.
[6] CHO J Y,YAN J,GREGORY J A,et al. 3-dimensional blow torch-molding of fused silica microstructures[J]. Journal of Microelectromechanical Systems, 2013,22(6):1276- 1284.
CHO J Y,YAN J,GREGORY J A,et al. 3-dimensional blow torch-molding of fused silica microstructures[J]. Journal of Microelectromechanical Systems, 2013,22(6):1276- 1284.
[7] BOYD C,WOO J K,CHO J Y,et al. Effect of drive-axis displacement on MEMS birdbath resonator gyroscope performance[C]// 2017 IEEE International Symposium on Inertial Sensors and Systems(INERTIAL). Kauai,HI,USA:IEEE, 2017:1-2.
BOYD C,WOO J K,CHO J Y,et al. Effect of drive-axis displacement on MEMS birdbath resonator gyroscope performance[C]// 2017 IEEE International Symposium on Inertial Sensors and Systems(INERTIAL). Kauai,HI,USA:IEEE, 2017:1-2.
[8] PAI P,CHOWDHURY F K,MASTRANGELO C H,et al. MEMS-based hemispherical resonator gyroscopes[C]// 2012 IEEE SENSORS. Taipei,Taiwan,China:IEEE, 2012:1-4.
PAI P,CHOWDHURY F K,MASTRANGELO C H,et al. MEMS-based hemispherical resonator gyroscopes[C]// 2012 IEEE SENSORS. Taipei,Taiwan,China:IEEE, 2012:1-4.
[9] PAI P,CHOWDHURY F K,POURZAND H,et al. Fabrication and testing of hemispherical MEMS wineglass resonators[C]// IEEE International Conference on Micro Electro Mechanical Systems. Taipei,Taiwan,China:IEEE, 2015:677-680.
PAI P,CHOWDHURY F K,POURZAND H,et al. Fabrication and testing of hemispherical MEMS wineglass resonators[C]// IEEE International Conference on Micro Electro Mechanical Systems. Taipei,Taiwan,China:IEEE, 2015:677-680.
[10] VAFANEJAD A,KIM E S. Effect of diaphragm perforation on quality factor of hemispherical resonator gyroscope[C]// Transducers-International Conference on Solid-state Sensors. Anchorage,AK,USA:IEEE, 2015:27-30.
VAFANEJAD A,KIM E S. Effect of diaphragm perforation on quality factor of hemispherical resonator gyroscope[C]// Transducers-International Conference on Solid-state Sensors. Anchorage,AK,USA:IEEE, 2015:27-30.
[11] FEGELY L C,HUTCHISON D N,BHAVE S A. Isotropic etching of 111 SCS for wafer-scale manufacturing of perfectly hemispherical silicon molds[C]// Solid-state Sensors, Actuators & Microsystems Conference. Beijing:IEEE, 2011:2295-2298.
FEGELY L C,HUTCHISON D N,BHAVE S A. Isotropic etching of 111 SCS for wafer-scale manufacturing of perfectly hemispherical silicon molds[C]// Solid-state Sensors, Actuators & Microsystems Conference. Beijing:IEEE, 2011:2295-2298.
[12] MUSTAFA M T,SEN D,AJAY B,et al. Acceleration insensitive hemispherical shell resonators using pop-up rings[C]// IEEE International Conference on Micro Electro Mechanical Systems. Belfast,UK:IEEE, 2018:956-959.
MUSTAFA M T,SEN D,AJAY B,et al. Acceleration insensitive hemispherical shell resonators using pop-up rings[C]// IEEE International Conference on Micro Electro Mechanical Systems. Belfast,UK:IEEE, 2018:956-959.
[13] GRAY J M,HOULTON J P,GERTSCH J C,et al. Hemispherical micro-resonators from atomic layer deposition[J]. Journal of Micromechanics and Microengineering, 2014,24 (12):125028-125037.
GRAY J M,HOULTON J P,GERTSCH J C,et al. Hemispherical micro-resonators from atomic layer deposition[J]. Journal of Micromechanics and Microengineering, 2014,24 (12):125028-125037.
[14] STEINERT M,ACKER J,OSWALD S,et al. Study on the mechanism of silicon etching in HNO3-rich HF/HNO3 mixtures[J]. Journal of Physical Chemistry C, 2007,111(5):2133- 2140.
STEINERT M,ACKER J,OSWALD S,et al. Study on the mechanism of silicon etching in HNO3-rich HF/HNO3 mixtures[J]. Journal of Physical Chemistry C, 2007,111(5):2133- 2140.
[15] STEINERT M,ACKER J,MATTHIASK,et al. Reactive species generated during wet chemical etching of silicon in HF/HNO3 mixtures[J]. Journal of Physical Chemistry B, 2006,110(23):11377-11381.
STEINERT M,ACKER J,MATTHIASK,et al. Reactive species generated during wet chemical etching of silicon in HF/HNO3 mixtures[J]. Journal of Physical Chemistry B, 2006,110(23):11377-11381.
[16] STEINERT M,ACKER J,WETZIG K. New aspects on the reduction of nitric acid during wet chemical etching of silicon in concentrated HF/HNO3 mixtures[J]. Journal of Physical Chemistry C, 2008,112(36):14139-14144.
STEINERT M,ACKER J,WETZIG K. New aspects on the reduction of nitric acid during wet chemical etching of silicon in concentrated HF/HNO3 mixtures[J]. Journal of Physical Chemistry C, 2008,112(36):14139-14144.
[17] HAMZAH A A,YEOP MAJLIS B,YUNAS J,et al. Optimization of HNA etching parameters to produce high aspect ratio solid silicon microneedles[J]. Journal of Micromechanics & Microengineering, 2012,22(9):95017-95026.
HAMZAH A A,YEOP MAJLIS B,YUNAS J,et al. Optimization of HNA etching parameters to produce high aspect ratio solid silicon microneedles[J]. Journal of Micromechanics & Microengineering, 2012,22(9):95017-95026.
[18] TURNER D R. On the mechanism of chemically etching germanium and silicon[J]. Journal of the Electrochemical Society, 1960,107(10):810-816.
TURNER D R. On the mechanism of chemically etching germanium and silicon[J]. Journal of the Electrochemical Society, 1960,107(10):810-816.
[19] SCHWARTZ B,ROBBINS H. Chemical etching of silicon I-the system HF,HNO3 and H2O[J]. Journal of the Electrochemical Society, 1959,106(6):505-508.
SCHWARTZ B,ROBBINS H. Chemical etching of silicon I-the system HF,HNO3 and H2O[J]. Journal of the Electrochemical Society, 1959,106(6):505-508.
[20] SCHWARTZ B,ROBBINS H.Chemical etching of silicon II-the system HF,HNO 3,H2O and HC2H3O2[J]. Journal of the Electrochemical Society, 1960,107(2):108-111.
SCHWARTZ B,ROBBINS H.Chemical etching of silicon II-the system HF,HNO 3,H2O and HC2H3O2[J]. Journal of the Electrochemical Society, 1960,107(2):108-111.
[21] SCHWARTZ B,ROBBINS H. Chemical etching of silicon III-a temperature study in the acid system[J]. Journal of the Electrochemical Society, 1961,108(4):365-372.
SCHWARTZ B,ROBBINS H. Chemical etching of silicon III-a temperature study in the acid system[J]. Journal of the Electrochemical Society, 1961,108(4):365-372.
[22] SCHWARTZ B,ROBBINS H. Chemical etching of silicon IV-etching technology[J]. Journal of the Electrochemical Society, 1976,123(11):1903-1909.
SCHWARTZ B,ROBBINS H. Chemical etching of silicon IV-etching technology[J]. Journal of the Electrochemical Society, 1976,123(11):1903-1909.
[23] SCHWARTZ B,ROBBINS H. Chemical etching of Germanium in solutions of HF,HNO3,H2O, and HC2H3O2[J]. Journal of the Electrochemical Society, 1964,111(2):196-201.
SCHWARTZ B,ROBBINS H. Chemical etching of Germanium in solutions of HF,HNO3,H2O, and HC2H3O2[J]. Journal of the Electrochemical Society, 1964,111(2):196-201.
[24] BAUHUBER M,MIKRIEVSKIJ A,LECHNER A. Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions[J]. Materials Science in Semiconductor Processing, 2013,16(6):1428-1433.
BAUHUBER M,MIKRIEVSKIJ A,LECHNER A. Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions[J]. Materials Science in Semiconductor Processing, 2013,16(6):1428-1433.
[25] HUI W C. How to prevent a runaway chemical reaction in the isotropic etching of silicon with HF/HNO3/CH3COOH or HNA solution[J]. Proceedings of SPIE, 2004 (5276):270-279.
HUI W C. How to prevent a runaway chemical reaction in the isotropic etching of silicon with HF/HNO3/CH3COOH or HNA solution[J]. Proceedings of SPIE, 2004 (5276):270-279.
[26] HEIDARI A,CHAN M L,YANG H A,et al. Hemispherical wineglass resonators fabricated from the microcrystalline diamond[J]. Journal of Micromechanics and Microengineering, 2013,23(12):125016-1-8.
HEIDARI A,CHAN M L,YANG H A,et al. Hemispherical wineglass resonators fabricated from the microcrystalline diamond[J]. Journal of Micromechanics and Microengineering, 2013,23(12):125016-1-8.
[27] HEIDARI A,CHAN M L,YANG H A,et al. Micromachined polycrystalline diamond hemispherical shell resonators[C]// IEEE 2013 Transducers & Eurosensors XXVII. Barcelona, Spain:IEEE, 2013:2415-2418.
HEIDARI A,CHAN M L,YANG H A,et al. Micromachined polycrystalline diamond hemispherical shell resonators[C]// IEEE 2013 Transducers & Eurosensors XXVII. Barcelona, Spain:IEEE, 2013:2415-2418.
[28] ALBERO J,NIERADKO L,GORECKI C,et al. Fabrication of spherical microlenses by a combination of isotropic wet etching of silicon and molding techniques[J]. Optics Express, 2009,17(8):6283-6292.
ALBERO J,NIERADKO L,GORECKI C,et al. Fabrication of spherical microlenses by a combination of isotropic wet etching of silicon and molding techniques[J]. Optics Express, 2009,17(8):6283-6292.
[29] LEE J K,CHOI J C,JANG W I,et al. Electrowetting lens employing hemispherical cavity formed by hydrofluoric acid, nitric acid, and acetic acid etching of silicon[J]. Japanese Journal of Applied Physics, 2012,51(6):06FL05-1-7.
LEE J K,CHOI J C,JANG W I,et al. Electrowetting lens employing hemispherical cavity formed by hydrofluoric acid, nitric acid, and acetic acid etching of silicon[J]. Japanese Journal of Applied Physics, 2012,51(6):06FL05-1-7.
[30] NEGI S,BHANDARI R,SOLZBACHER F. Novel isotropic and anisotropic etching of MEMS structures by controlling the dynamics of the etchant[C]// 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference. Beijing: IEEE, 2011:2362-2365.
NEGI S,BHANDARI R,SOLZBACHER F. Novel isotropic and anisotropic etching of MEMS structures by controlling the dynamics of the etchant[C]// 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference. Beijing: IEEE, 2011:2362-2365.
[31] 苏菲,尚德重,汪建波,等. 基于陀螺仪和加速度计的帆船运动姿态测量[J]. 太赫兹科学与电子信息学报, 2014,12(2): 183-189. (SU Fei,SHANG Dezhong,WANG Jianbo,et al. A measurement method of sailing attitude based on MEMS gyroscope and accelerometer[J]. Journal of Terahertz Science and Electronic Information Technology, 2014,12(2):183-189.)
苏菲,尚德重,汪建波,等. 基于陀螺仪和加速度计的帆船运动姿态测量[J]. 太赫兹科学与电子信息学报, 2014,12(2): 183-189. (SU Fei,SHANG Dezhong,WANG Jianbo,et al. A measurement method of sailing attitude based on MEMS gyroscope and accelerometer[J]. Journal of Terahertz Science and Electronic Information Technology, 2014,12(2):183-189.)
郑显泽, 唐彬, 王月, 熊壮. 基于 HNA溶液腐蚀的微半球谐振陀螺研究进展[J]. 太赫兹科学与电子信息学报, 2020, 18(3): 538. ZHENG Xianze, TANG Bin, WANG Yue, XIONG Zhuang. Research progress of micro-scale hemispherical resonator gyroscopes based on etching of HNA solution[J]. Journal of terahertz science and electronic information technology, 2020, 18(3): 538.