热处理对离子束溅射Ta<sub>2</sub>O<sub>5</sub>薄膜特性的影响

利用离子束溅射沉积技术制备了Ta2O5薄膜,在100~600 ℃的大气氛围中对其进行热处理(步进温度为100 ℃),并对热处理后样品的光学常数(折射率、折射率非均匀性、消光系数和物理厚度)、应力、晶向和表面形貌进行了研究。研究显示,随着热处理温度增加,薄膜折射率整体呈下降趋势,折射率非均匀性和物理厚度呈增加趋势,结果有效地改善了薄膜的消光系数和应力,但薄膜的晶向和表面形貌均未出现明显的变化。结果表明：热处理可以有效改变薄膜特性,但需要根据Ta2O5薄膜具体应用综合选择最优的热处理温度。本文对离子束溅射Ta2O5薄膜的热处理参数选择具有指导意义。

Abstract

Ta2O5 films were deposited by Ion Beam Sputtering (IBS) technique and they were annealed in air at the temperatures from 100 ℃ to 600 ℃ with a step of 100 ℃. Then the optical constants after annealing (refractive index, the inhomogeneity of refractive index, extinction coefficient and physical thickness), stress, crystalline and surface morphology were systematically studied. The experimental results indicate that with the annealing temperature increasing, the refractive indexes of the films decrease in the mass and the inhomogeneity of refractive index and the film thickness increase, by which the extinction coefficient and stress are improved. However, the crystal orientation and surface morphology of the films are no significant change. These results demonstrate that the thermal processing changes the characteristics of films but the thermal processing temperature for Ta2O5 films should be selected based on the application demands. These results will be a reference for parameter selection in Ta2O5 film deposition by the IBS.

参考文献

[1] HERRMANN W C. E-beam deposition characteristics of reactively evaporated Ta2O5 for optical interference coatings ［J］. Journal of Vacuum Science and Technology, 1981,18(3):1303-1305.

[2] SCHILLER S, HEISIG U, STEINFELDER K, et al.. Reactive DC sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films ［J］. Thin Solid Films, 1979, 63(2): 369-375.

[3] 卫耀伟, 刘志超, 陈松林. TiO2/Al2O3薄膜的原子层沉积和光学性能分析［J］. 中国光学, 2011,4(2):188-195.

WEI Y W, LIU ZH CH, CHEN S L. Optical characteristics of TiO2/Al2O3 thin films and their atomic layer depositions［J］. Chinese Optics, 2011, 4(2):188-195. (in Chinese)

[4] MARTIN P J, MACLEOD H A, NETTERFIELD R P, et al.. Ion-beam-assisted deposition of thin films ［J］. Applied Optics, 1983, 22(1):178-184.

[5] 申振峰. 特定折射率材料及光学薄膜制备［J］. 中国光学, 2013,6(6):900-905.

SHEN ZH F. Preparation of specific refractive index materials and optical thin films ［J］. Chinese Optics, 2013,6(6):900-905. (in Chinese)

[6] AL-JUMAILY G A, EDLOU S M. Optical properties of tantalum pentoxide coatings deposited using ion beam processes ［J］. Thin Solid Films, 1992, 209(2):223-229.

[7] DEMIRYONT H, SITES J R, GEIB K. Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering ［J］. Applied Optics, 1985, 24(4):490-495.

[8] LIU H, XIONG S, LI L, et al.. Variation of the deposition rate during ion beam sputter deposition of optical thin films ［J］. Thin Solid Films, 2005, 484(1):170-173.

[9] YOON S G, KIM Y T, KIM H K, et al.. Comparison of residual stress and optical properties in Ta2O5 thin films deposited by single and dual ion beam sputtering ［J］. Materials Science and Engineering: B, 2005, 118(1):234-237.

[10] YOON S G, KIM H K, KIM M J, et al.. Effect of substrate temperature on surface roughness and optical properties of Ta2O5 using ion-beam sputtering ［J］. Thin Solid Films, 2005, 475(1):239-242.

[11] HUANG A P, CHU P K. Characteristics of interface between Ta2O5 thin film and Si (100) substrate ［J］. Surface and Coatings Technology, 2005, 200(5):1714-1718.

[12] CHENG W H, CHI S F, CHU A K. Effect of thermal stresses on temperature dependence of refractive index for Ta2O5 dielectric films ［J］. Thin Solid Films, 1999, 347(1): 233-237.

[13] LIU W J, CHIEN C H. Influences of residual argon gas and thermal annealing on Ta2O5 thin films ［J］. Japanese Journal of Applied Physics, 2005, 44(1R):181.

[14] HUANG A P, CHU P K. Crystallization improvement of Ta2O5 thin films by the addition of water vapor ［J］. Journal of Crystal Growth, 2005, 274(1):73-77.

[15] MASSE J P, SZYMANOWSKI H, ZABEIDA O, et al.. Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films ［J］. Thin Solid Films, 2006, 515(4):1674-1682.

[16] UTHANNA S, CHANDRA S V, REDDY P S, et al.. Effect of postdeposition annealing on the structural, electrical, and optical properties of DC magnetron sputtered Ta2O5 films［J］.J. Phys. Conf. Ser.,2008,114(1):012035.

[17] 刘华松, 王利栓, 姜玉刚, 等. 离子束溅射制备SiO2薄膜折射率与应力调整［J］. 光学精密工程, 2013,21(9): 2238-2243.

LIU H S, WANG L SH, JIANG Y G, et al.. Adjusting methods of refractive index and stress of SiO2 films prepared by IBS technology ［J］. Opt. Precision Eng., 2013, 21(9): 2238-2243. (in Chinese)

[18] STONEY G G.The tension of metallic films deposited by electrolysis［J］.Pro. R Soc. A,1909,82:172-175.

刘华松, 姜承慧, 王利栓, 刘丹丹, 季一勤, 陈德应. 热处理对离子束溅射Ta₂O₅薄膜特性的影响[J]. 光学精密工程, 2014, 22(10): 2645. LIU Hua-song, JIANG Cheng-hui, WANG Li-shuan, LIU Dan-dan, JI Yi-qin, CHEN De-ying. Effects of annealing on properties of Ta₂O₅ thin films deposited by ion beam sputtering[J]. Optics and Precision Engineering, 2014, 22(10): 2645.

热处理对离子束溅射Ta₂O₅薄膜特性的影响

关于本站 Cookie 的使用提示

全站搜索

热处理对离子束溅射Ta2O5薄膜特性的影响

相关论文

相关资讯

关于本站 Cookie 的使用提示

全站搜索

热处理对离子束溅射Ta₂O₅薄膜特性的影响