[1] Campbell J H.Damage resistant optics for a mega-joule solid-state laser[C]//Proc of SPIE.1990,1441:444-456.

[2] Hervé Bercegol.The impact of laser damage on the lifetime of optical components in fusion lasers[C]//Proc of SPIE.2004,5272:312-324.

[3] Shen Jian,Liu Shouhua,Yi Kui,et al.Subsurface damage in optical substrates[J].Optik,2005,116(6):288-294.

[4] 胡建平,马平,许乔.用1064 nm激光增强HfO2/SiO2薄膜的抗激光损伤能力的实验研究[J].强激光与粒子束,2003,15(11):1053-1056.(Hu Jianping,Ma Ping,Xu Qiao.Damage threshold improvement of HfO2/SiO2 coating by 1064 nm laser conditioning.High Power Laser and Particle Beams,15(11):1053-1056)

[5] 潘鑫,马志斌,李国伟,等.氧等离子体刻蚀CVD金刚石膜的影响机理[J].强激光与粒子束,2014,26:074001.(Pan Xin,Ma Zhibin,Li Guowei,et al.Mechanism of etching CVD diamond film by oxygen plasma.High Power Laser and Particle Beams,2014,26:074001)

[6] Trecard M,Dumas P R,Golini D.New industrial applications of magnetorheological finishing[R].Rochester:Optical Fabrication and Testing.2004.

[7] Davies M A.Application of precision diamond machining to the manufacture of micro-photonics components[C]//Proc of SPIE.2003:5183:94-108.

[8] 马彬,沈正祥,张众,等.低亚表面损伤石英光学基底的加工和检测技术[J].强激光与粒子束,2010,22 (9):2181-2185.(Ma Bin,Shen Zhengxiang,Zhang Zhong,et al.Fabrication and detection technique of fused silica substrate with extremely low subsurface damage.High Power Laser and Particle Beams,2010,22(9):2181-2185)

[9] 苗向心,程晓锋,王洪彬,等.高功率激光装置大口径光学元件侧面清洗实验[J].强激光与粒子束,2013,25(4):890-894.(Miao Xinxiang,Cheng Xiaofeng,Wang Hongbin,et al.Experiment on cleaning side of large-aperture optics in high power laser system.High Power Laser and Particle Beams,2013,25(4):890-894)

[10] 徐世珍,吕海兵,田东斌,等.酸蚀深度对熔石英三倍频激光损伤阈值的影响[J].强激光与粒子束,2008,20(5):760-764.(Xu Shizhen,Lü Haibing,Tian Dongbin,et al.Effects of acid-etching depth on 355 nm laser-induced damage threshold of fused silica.High Power Laser and Particle Beams,2008,20(5):760-764)

[11] 陈宁,张清华,许乔,等.K9基片的亚表面损伤探测及化学腐蚀处理技术研究[J].强激光与粒子束,2005,17(9):1289-1293.(Chen Ning,Zhang Qinghua,Xu Qiao,et al.Studies on subsurface damage detection and wet-etching process of K9 optics.High Power Laser and ParticleBeams,2005,17(9):1289-1293)

[12] Suratwala T I.HF-based etching processes for improving laser damage resistance of fused silica optical surfaces[J].J Am Ceram,2011,94(2):416-428.

[13] Bouchut.Wet chemical etching of silicate glasses in hydrofluoric acid based solutions[C]//Proc of SPIE.2003,4932:103-111.

[14] ISO 11254-1.Lasers and laser-related equipment- Determination of evaporation of laser-induced damage threshold of optical surfaces—Part 1:1-on-1 test［S］.

[15] ISO 11254-2.Lasers and laser-related equipment- Determination of evaporation of laser-induced damage threshold of optical surfaces—Part 2:S-on-1 test［S］.

[16] Jean H,Pierre G,Jean D,et al.R-on-1 automatic mapping:a new tool for laser damage testing[C]//Proc of SPIE.1996,2714:90-101.

[17] Polar K,Peter A.Etching study on beta barium metaborate(β-BaB2O4) single crystals[J].Journal of Crystal Growth,1993,134:219- 226.