激光与光电子学进展, 2015, 52 (2): 021602, 网络出版: 2015-01-21   

基于SiO2膜的GaInP/AlGaInP无杂质空位扩散诱导量子阱混杂的研究

Impurity-Free Vacancy Diffusion Induces Intermixing in GaInP/AlGaInP Quantum Wells Using SiO2 Encapsulation
作者单位
1 西安理工大学自动化与信息工程学院, 陕西 西安 710048
2 中国科学院西安光学精密机械研究所瞬态光学与光子技术国家重点实验室,陕西 西安 710119
3 中国科学院半导体研究所, 北京 100083
摘要
在红光半导体激光器芯片上采用SiO2 介质膜进行无杂质空位扩散诱导量子阱混杂研究。激光器芯片的有源区是由两个6 nm 厚的GaInP 量子阱和三个8 nm 厚的AlGaInP 量子垒构成,利用电子束蒸发方法在芯片表面生长了250 nm SiO2介质膜。在不同温度下进行时长60 s 的高温快速退火诱发量子阱混杂。通过光致发光光谱分析样品混杂之后的波长蓝移情况和光谱半峰全宽变化规律。当退火温度达到900℃时,样品获得29.5 nm 的最大波长蓝移;在750℃的退火温度下获得43 nm 的最小光谱半峰全宽。
Abstract
Impurity-free vacancy diffusion (IFVD) induced quantum well intermixing (QWI) of red light diode laser wafer using silicon dioxide (SiO2) encapsulation is explored. The wafer has an active region of two 5 nm-thick GaInP quantum wells and three 8 nm-thick AlGaInP barriers. The 250 nm SiO2 dielectric layer is prepared through electron beam evaporation method. The QWI is induced by rapid thermal annealing for 60 s at different temperatures. Blue shifts and full width at half maximum (FWHM) are obtained through photoluminescence tests. A maximum blue shift of 29.5 nm is obtained at 900 °C annealing temperature and an optimal FWHM of 43 nm by the IFVD-induced QWI is noted at 750 ℃.
参考文献

[1] 谢红云, 霍文娟, 江之韵, 等. 非统一多量子阱波长可选DFB 激光器[J]. 中国激光, 2012, 39(10): 1002002.

    Xie Hongyun, Huo Wenjuan, Jiang Zhiyun, et al.. Wavelength selectable DFB laser based on non-uniform multiple quantum wells [J]. Chinese J Lasers, 2012, 39(10): 1002002.

[2] 李建军, 崔碧峰, 邓军, 等. 非对称超大光腔980 nm 大功率半导体激光器[J]. 中国激光, 2013, 40(11): 1102011.

    Li Jianjun, Cui Bifeng, Deng Jun, et al.. 980 nm high power semiconductor laser with asymmetric super large optical cavity [J]. Chinese J Lasers, 2013, 40(11): 1102011.

[3] 朱洪波, 郝明明, 彭航宇, 等. 基于808 nm 半导体激光器单管合束技术的光纤耦合模块[J]. 中国激光, 2012, 39(5): 0502001.

    Zhu Hongbo, Hao mingming, Peng Hangyu, et al.. Module of fiber coupled diode laser based on 808 nm single emitters combination [J]. Chinese J Lasers, 2012, 39(5): 0502001.

[4] 刘斌, 刘媛媛, 崔碧峰. 980 nm 半导体激光器长期老化结果及失效分析[J]. 激光与光电子学进展, 2012, 49(9): 091404.

    Liu Bin, Liu Yuanyuan, Cui Bifeng. Long-term aging and failure analysis for 980 nm laser diodes [J]. Laser & Optoelectronics Progress, 2012, 49(9): 091404.

[5] B W Hakki, F R Nash. Catastrophic failure in GaAs double-heterostructure injection lasers [J]. J Appl Phys, 1974, 45(9): 3907-3912.

[6] S P Najda, G Bacchin, B Qiu, et al.. Benefits of quantum well intermixing in high power diode lasers [C]. SPIE, 2004, 5365: 1-13.

[7] R Lai, J Pamulapati, P K Bhattacharya, et al.. Low-loss, single-mode In0.53Ga0.47As/In0.52Al0.48As/InP optical waveguides fabricated by Zn-induced impurity-induced layer disordering [J]. J Appl Phys, 1991, 70(9): 5136-5137.

[8] B M Gordon, W R James, S W Chad, et al.. Electronic absorption modulator performance predicted from band-edge absorption spectra of bulk, quantum-well, and quantum-well-intermixed InGaAsP structures [J]. Solid-State Electron, 2007, 51(1): 38-47.

[9] B T Gregory, B A David. Barrier-enhanced InGaAs/InAlAs photodetectors using quantum-well intermixing [J]. Solid-State Electron, 2004, 48(10-11): 1783-1790.

[10] H S Djie, T Mei. Plasma-induced quantum well intermixing for the universal high-density photonic integration [J]. J Cryst Growth, 2006, 288(1): 49-52.

[11] J Zhao, J Chen, Z C Feng, et al.. Band gap blue shift of InGaAs/InP multiple quantum wells by different dielectric film coating and annealing [J]. Thin Solid Films, 2006, 498(1-2): 179-182.

[12] 周路, 薄报学, 王云华, 等. 基于无杂质空位混杂法制备带有无吸收窗口的940 nm GaInP/GaAsP/GaInAs 半导体激光器研究[J]. 中国激光, 2012, 39(8): 0802001.

    Zhou Lu, Bo Baoxue, Wang Yunhua, et al.. Study of 940 nm semiconductor lasers with non-absorb window structure fabricated by impurity-free vacancy disordering [J]. Chinese J Lasers, 2012, 39(8): 0802001.

[13] N H Ky, J D Ganiere, M Gaihanou, et al.. Self-interstitial mechanism for Zn diffusion-induced disording of GaAs/AlxGa1-xAs (x=0.1-1) multiple quantum well structures [J]. J Appl Phys, 1993, 73(8): 3769-3781.

[14] S Dhamodaran, G Devaraju, A P Pathak, et al.. Ion beam modification studies of InP based multi quantum wells[J]. Nucl Instrum Meth Phys B, 2008, 266(8): 1810-1815.

[15] J E Epler, R D Burnham, R L Thornton, et al.. Laser induced disording of GaAs-AlGaAs superlattice and incorporation Si impurity [J]. Appl Phys Lett, 1986, 49(21): 1447-1449.

[16] D Nie, T Mei, H S Djie, et al.. Analysis of inductively coupled argon plasma-enhanced quantum-well intermixing process for multiple bandgap implementation [J]. J Cryst Growth, 2006, 288(1): 32-35.

[17] C J Mclean, J H Marsh, R M Delarue, et al.. Layer selective disordering by photoabsorption induced thermal diffusion in InGaAs/InP based multiquantum well structures [J]. Electron Lett, 1992, 28(12): 1117-1119.

[18] Z Qiao, X Tang, E K K Lee, et al.. Large energy band-gap tuning of 980 nm InGaAs/InGaAsP quantum well structure via quantum well intermixing [J]. Solid-State Electron, 2013, 79: 281-284.

[19] J Y Chi, X Wen, E S Koteles, et al.. Spatially selective modification of GaAs/AlGaAs quantum wells by SiO2 capping and rapid thermal annealing [J]. Appl Phys Lett, 1989, 55(9): 855-857.

林涛, 张浩卿, 孙航, 王勇刚, 林楠, 马骁宇. 基于SiO2膜的GaInP/AlGaInP无杂质空位扩散诱导量子阱混杂的研究[J]. 激光与光电子学进展, 2015, 52(2): 021602. Lin Tao, Zhang Haoqing, Sun Hang, Wang Yonggang, Lin Nan, Ma Xiaoyu. Impurity-Free Vacancy Diffusion Induces Intermixing in GaInP/AlGaInP Quantum Wells Using SiO2 Encapsulation[J]. Laser & Optoelectronics Progress, 2015, 52(2): 021602.

本文已被 1 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!