多点实时光刻机光源照度均匀度检测系统设计 下载: 1152次
赵可为, 谭艾英, 尹韶云, 蔡文涛, 杨若夫, 陈建军, 佟首峰. 多点实时光刻机光源照度均匀度检测系统设计[J]. 激光与光电子学进展, 2018, 55(6): 061203.
Kewei Zhao, Aiying Tan, Shaoyun Yin, Wentao Cai, Ruofu Yang, Jianjun Chen, Shoufeng Tong. Design of Multi-Point Real-Time Lithography Light Source Uniformity Detection System[J]. Laser & Optoelectronics Progress, 2018, 55(6): 061203.
[1] 刘鹏飞, 杨波, 陆侃. 紫外曝光机均匀照明系统的设计与研究[J]. 光学仪器, 2012, 34(2): 31-36.
[2] 高轩. UV-LED曝光系统及曝光工艺研究[D]. 北京: 北京交通大学, 2016.
GaoX. The research of UV-LED lithography system and process[D]. Beijing: Beijing Jiaotong University, 2016.
[3] 许爽. 基于成像光强的光刻机像差原位检测理论与方法研究[D]. 武汉: 华中科技大学, 2016.
XuS. Theory and method for in-situ lens aberration measurement in optical lithographic tools based on image intensity[D]. Wuhan: Huazhong University of Science and Technology, 2016.
[4] 王军. 光刻工艺中聚酰亚胺层光阻减量和线宽均匀性研究[D]. 天津: 天津大学, 2012.
WangJ. Litho polyimide layer resist reduction and CD uniformity research[D]. Tianjin: Tianjin University, 2012.
[5] 赵阳. 深紫外光刻复杂照明光学系统设计[D]. 长春: 中国科学院长春光学精密机械与物理研究所, 2010.
ZhaoY. Design of complex illumination optical system for deep ultraviolet lithography[D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences,China, 2010.
[6] 闫建新, 范伟宏, 李立文, 等. 光刻机曝光均匀性在线检测方法[J]. 半导体检测与测试技术, 2012, 37(7): 577-581.
Yan J X, Fan W H, Li L W, et al. On-line monitoring methods for the exposure uniformity of the stepper[J]. Semiconductor Inspection & Testing Technologies, 2012, 37(7): 577-581.
[7] 孙玉杰, 汪岳峰. 利用线阵CCD测量照明光场均匀度[J]. 中国测试技术, 2003( 4): 26- 32.
Sun YJ, Wang YF. Measurement of uniformity of illumination field using linear array CCD[J]. China Measurement Technology, 2003( 4): 26- 32.
[8] 刘新刚, 李仰军, 高健. 激光平行光幕光能分布均匀性测量研究[J]. 光电技术应用, 2010, 25(5): 12-14.
[9] 沈湘衡, 杨亮, 贺庚贤, 等. 光电测量设备光学系统的像面照度均匀性检测[J]. 光学精密工程, 2008, 16(12): 2531-2536.
Shen X H, Yang L, He G X, et al. Measurement of image plane illumination non-uniformity of optical system in photoelectric equipment[J]. Optics and Precision Engineering, 2008, 16(12): 2531-2536.
[10] KangD, YangH, ShaD, et al. Measurement of image plane illumination uniformity of photoelectric imaging system[C]. International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2014: 92822O.
[11] 蔡怀宇, 刘铁根, 傅维乔, 等. 一种照相机成像平面照度均匀度检测系统[J]. 光学技术, 2000, 26(5): 392-394.
Cai H Y, Liu T G, Fu W Q, et al. A system for examining the illumination uniformity of camera imaging planes[J]. Optical Technique, 2000, 26(5): 392-394.
[12] 张燕, 曾光宇, 洪志刚. 硅PIN光电二极管探测系统的研究[J]. 核电子学与探测技术, 2008, 20(2): 391-393.
Zhang Y, Zeng G Y, Hong Z G. Research of the silicon PIN diode detecting system[J]. Nuclear Electronics & Detection Technology, 2008, 20(2): 391-393.
[13] GraemeJ. Photodiode amplifiers and OP AMP solutions[M]. Beijing: Science Press, 2012.
GraemeJ. 光电二极管及其放大电路设计[M]. 北京: 科学出版社, 2012.
[15] 徐胜, 徐玉珍, 陈恩果, 等. 大功率LED伏安特性模型研究[J]. 光电子·激光, 2015, 26(11): 2076-2082.
Xu S, Xu Y Z, Chen E G, et al. Study on the new models of high power LED current-voltage characteristics[J]. Journal of Optoelectronics·Laser, 2015, 26(11): 2076-2082.
[16] 刘民, 杨亦强. 均匀性的瞬态测量[J]. 宇航计测技术, 2001, 21(6): 56-61.
Liu M, Yang Y Q. Instant measurement for physical parameter special distribution uniformity[J]. Journal of Astronautic Metrology and Measurement, 2001, 21(6): 56-61.
赵可为, 谭艾英, 尹韶云, 蔡文涛, 杨若夫, 陈建军, 佟首峰. 多点实时光刻机光源照度均匀度检测系统设计[J]. 激光与光电子学进展, 2018, 55(6): 061203. Kewei Zhao, Aiying Tan, Shaoyun Yin, Wentao Cai, Ruofu Yang, Jianjun Chen, Shoufeng Tong. Design of Multi-Point Real-Time Lithography Light Source Uniformity Detection System[J]. Laser & Optoelectronics Progress, 2018, 55(6): 061203.