介绍了一种提高红外器件磁控溅射沉积镀膜厚度均匀性的方法。这种方法被称为基片离心旋转法，是在保持磁控溅射靶不动及靶和样品台间距不变的情况下，通过样品台离心旋转的方法，补偿或改善圆形磁控靶在正对的基片上沿径向的溅射沉积不均匀分布，是一种动态沉积法。这种方法可以在不改变磁控靶结构的情况下大大提高磁控溅射沉积镀膜的厚度均匀性。

A method of improving the thickness uniformity of thin film deposited by magnetron sputtering systems was introduced. This method is called the sample stage eccentric axial circumrotating. It can make up or improve the film thickness distribution on the radial direction through the sample stage eccentric axial circumrotating without changing the magnetron target’s position and the distance between the target and the sample stage. It’s a dynamic way and it can be used to improve the films thickness uniformity without changing the target structure of a magnetron sputtering system.