溅射功率对碳化硼薄膜组分与力学性能的影响
[1] Moses E I. The national ignition facility(NIF): a path to fusion energy[J]. Energy Conversion and Management, 2008, 49(7): 1795-1802.
[2] 郑伟,徐姣,张卫江.核用碳化硼制备工艺研究进展[J].现代化工, 2011, 31: 24-27.(Zheng Wei, Xu Jiao, Zhang Weijiang. Progress in preparation of baron carbides used as unclear shielding material. Modern Chemical Industry, 2011, 31(1): 24-27)
[3] 张占文,漆小波,李波.惯性约束聚变点火靶候选靶丸特点及制备研究进展[J].物理学报, 2012, 61(10): 5204-5205.(Zhang Zhanwen, Qi Xiaobo, Li bo. Properties and fabrication status of capsules for ignition targets in inertial confinement fusion experiments. Acta Physica Sinica, 2012, 61(10): 5204-5205)
[6] Lousa A, Gimeno S. Ionassisted deposition of thin films by substrate tuned radio frequency magnetron sputtering[J]. Journal of Vacuum Science & Technology A, 1997, 15(1/2): 62-65.
[7] Pascual E, Martinez E, Esteve J, et al. Boron carbide thin films deposited by tuned substrate RF magnetron sputtering [J]. Diamond and Related Materials, 1999(8): 402-405.
[8] Burnham A K, Alford C S, Makowiecki D M, et al. Evaluation of B4C as an ablator material for NIF capsules[J]. Fus Technol, 1997, 31: 456-458.
[9] 杨水长,廖志君,刘振良,等.碳化硼薄膜的电子束蒸发制备及表面分析[J].稀有金属材料与工程, 2009, 38(s2): 564-567.(Yang Shuichang, Liao Zhijun, Liu Zhenliang, et al. Fabrication and surface analysis of boron carbide thin films by electron beam evaporation. Rare Metal Materials and Engineering, 2009, 38(s2): 564-567)
[10] 周向阳,蒋庄德,王海容,等.纳米压入法测试薄膜力学性能的若干关键影响因素分析[J].机械强度, 2007, 29(5): 737-740.(Zhou Xiangyang, Jiang Zhuangde, Wang Hairong, et al. Investigation on several crucial factors influencing the measurement of mechanical properties of thin films by nanoindentation technique. Journal of Mechanical Strength, 2007, 29(5): 737-740)
[11] Ouyang J H, Sasaki S. Friction and wear characteristics of a Ticontaining diamondlike carbon coating with a SRV tester at high contact load and elevated temperature[J]. Surf Coat Technol, 2005, 195(23): 234-244.
[12] 吴刚.材料结构表征及应用[M].北京:化学工业出版社, 2001: 454456.(Wu Gang. Materials structural characterization and applications. Beijing: Chemical Industry Press, 2001: 454-456)
[13] Jacobsohn L G, Schulze R K, Nastasi M, et al. Xray photoelectron spectroscopy investigation of boron carbide films deposited by sputtering[J]. Surface Science, 2004, 572: 418-421.
[14] 张颖,何智兵,闫建成,等.工作压强对硅掺杂辉光放电聚合物结构和性能的影响[J].物理学报, 2011, 60(6): 6803-6804.(Zhang Ying, He Zhibing, Yan Jiancheng, et al. Influence of pressure on structure and properties of Sidoped glow discharge polymer film. Acta Physica Sinica, 2011, 60(6): 6803-6804)
[15] 田民波,刘德令.薄膜科学与技术手册[M].北京:机械工业出版社, 1991: 402-403.(Tian Minbo, Liu Deling. The film science and technical manual. Beijing: China Machine Press, 1991: 402-403)
[16] Su G T, Hieda H. Field emission characteristics of boron carbon nit ride films synthesized by plasmaassisted chemical vapor deposition[J]. Diamond and Related Materials, 2000, 9(3/6): 1233-1236.
[17] 吴刚. 材料结构表征及应用[M].北京: 化学工业出版社, 2001: 15-21.(Wu Gang. Materials structural characterization and applications. Beijing: Chemical Industry Press, 2001: 15-21)
[18] 王玉新, 郑亚茹, 宋哲, 等. FTIR法研究BCN薄膜的内应力[J]. 光谱学与光谱分析, 2008, 28(7): 1526-1527.(Wang Yuxin, Zheng Yaru, Song Zhe, et al. FTIR spectroscopic studies of inner stress on boron carbon nitride thin films. Spectroscopy and Spectral Analysis, 2008, 28(7): 1526-1527)
张玲, 何智兵, 李俊, 许华, 谌家军. 溅射功率对碳化硼薄膜组分与力学性能的影响[J]. 强激光与粒子束, 2013, 25(9): 2317. Zhang Ling, He Zhibing, Li Jun, Xu Hua, Chen Jiajun. Influence of sputtering power on components and mechanical properties of boron carbide films[J]. High Power Laser and Particle Beams, 2013, 25(9): 2317.