强激光与粒子束, 2010, 22 (7): 1535, 网络出版: 2010-09-15
磁控溅射方法制备直径120 mm高均匀性Mo/Si多层膜
Fabrication of a high uniformity Mo/Si multilayer with a diameter of 120 mm using magnetron sputtering technology
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潘磊, 王晓强, 张众, 朱京涛, 王占山, 李乙洲, 李宏杰, 王道荣, 赵巨岩, 陆伟. 磁控溅射方法制备直径120 mm高均匀性Mo/Si多层膜[J]. 强激光与粒子束, 2010, 22(7): 1535. Pan Lei, Wang Xiaoqiang, Zhang Zhong, Zhu Jingtao, Wang Zhangshan, Li Yizhou, Li Hongjie, Wang Daorong, Zhao Juyan, Lu Wei. Fabrication of a high uniformity Mo/Si multilayer with a diameter of 120 mm using magnetron sputtering technology[J]. High Power Laser and Particle Beams, 2010, 22(7): 1535.
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