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沉积工艺对YbF3薄膜可靠性的影响

Influence of Deposition Process on Reliability of YbF3 Thin Films

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摘要

从沉积方式、薄膜厚度、沉积温度和离子束能量四个方面,研究了沉积工艺对氟化镱(YbF3)薄膜可靠性的影响。研究结果表明,相较于电阻加热蒸发方式,用电子束加热蒸发得到的YbF3薄膜,其致密性更好,水汽吸收更少;薄膜太厚或沉积温度太高会加大YbF3薄膜的应力,使薄膜表面出现裂痕,甚至使薄膜脱落;离子束辅助沉积可以增加YbF3薄膜的附着力,改善薄膜的表面质量;随着离子束能量的增加,薄膜的应力先增大后减小。根据以上研究结果得出YbF3薄膜的最佳沉积工艺,并研制出具有良好光谱性能和高可靠性的宽光谱增透膜。

Abstract

The influence of deposition process on the reliability of YbF3 films is studied from four aspects including deposition method, film thickness, substrate temperature and ion beam energy. The research results show that, in contrast to those by resistance heating evaporation, the films deposited by electron beam evaporation have a higher density and lower water-vapor absorption. When the film is too thick or the deposition temperature is too high, the stress of YbF3 film increases, which results in the occurrence of cracks on the film surface or the peeling of coatings. Ion-assisted deposition can enhance the adhesion of YbF3 films and improve the surface quality. As the ion beam energy increases, the stress of coatings first increases and then decreases. According to the above results, the optimal deposition process is obtained and a broadband anti-reflected coating with good optical properties and high reliability is produced.

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中图分类号:O484.4

DOI:10.3788/aos201838.0731002

所属栏目:薄膜

收稿日期:2018-01-17

修改稿日期:2018-02-27

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冯毅东1
2
于天燕1
刘定权1

联系人作者:于天燕(tyan_yu@mail.sitp.ac.cn)

备注:冯毅东(1993-),男,硕士研究生,主要从事红外光学薄膜方面的研究。E-mail: fyd310@126.com

【1】Ferrante R A, Paloian M A. Visible/long-wave infrared dichroic beam splitter[J]. Optical Engineering, 2005, 44(6): 063801.

【2】Xiong S M, Zhang Y D. Optical coatings for deuterium fluoride chemical laser systems[J]. Applied Optics, 1997, 36(21): 4958-4961.

【3】Zhuang Q H, Liu G J, Fu X H, et al. Design and fabrication of a depolarizing dichroic beam splitter working in band from near-UV to near-infrared[J]. Acta Optica Sinica, 2016, 36(11): 1131001.
庄秋慧, 刘国军, 付秀华, 等. 工作波段覆盖近紫外到近红外波的消偏振分色片的设计与研制[J]. 光学学报, 2016, 36(11): 1131001.

【4】Fu X H, Xiong S F, Liu D M, et al. Study and fabrication of wide angle and broad spectrum gray adjustment film in infrared imaging system[J]. Acta Optica Sinica, 2016, 36(5): 0531001.
付秀华, 熊仕富, 刘冬梅, 等. 大角度宽光谱红外成像系统灰度调节膜的研制[J]. 光学学报, 2016, 36(5): 0531001.

【5】Rudisill J E, Braunstein M, Braunstein A I. Optical coatings for high energy ZnSe laser windows[J]. Applied Optics, 1974, 13(9): 2075-2080.

【6】Zhang Y. Defect study on several fluoride coatings[J]. Proceedings of SPIE, 2009, 7283: 72832Q.

【7】Zhang Y P, Fan J Q, Long G Y, et al. Influence of deposition parameters on residual stress of YbF3 thin film[J]. Proceedings of SPIE, 2015, 9796: 97960N.

【8】Su W T. Research of long-wave infrared low refractive index materials[D]. Shanghai: Shanghai Institute of Technical Physics of the Chinese Academy of Sciences, 2007: 11.
苏伟涛. 长波红外低折射率材料研究[D]. 上海: 中国科学院上海技术物理研究所, 2007: 11.

【9】Davis C A. A simple model for the formation of compressive stress in thin films by ion bombardment[J]. Thin Solid Films, 1993, 226(1): 30-34.

【10】Bilek M M, Mckenzie D R. A comprehensive model of stress generation and relief processes in thin films deposited with energetic ions[J]. Surface & Coatings Technology, 2006, 200: 4345-4354.

引用该论文

Feng Yidong,Yu Tianyan,Liu Dingquan. Influence of Deposition Process on Reliability of YbF3 Thin Films[J]. Acta Optica Sinica, 2018, 38(7): 0731002

冯毅东1,2, 于天燕1, 刘定权1. 沉积工艺对YbF3薄膜可靠性的影响[J]. 光学学报, 2018, 38(7): 0731002

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