在InGaAs/GaAs表面量子点(SQDs)的GaAs势垒层中引入Si掺杂层，以研究Si掺杂对InGaAs/GaAs SQDs光学特性的影响。荧光发光谱(PL)测量结果显示，InGaAs/GaAs SQDs的发光强烈依赖于Si掺杂浓度。随着掺杂浓度的增加， SQDs的PL峰值位置先红移后蓝移； PL峰值能量与激光激发强度的立方根依赖关系由线性向非线性转变；通过组态交互作用方法发现SQDs的PL峰位蓝移减弱；时间分辨荧光光谱显示了从非线性衰减到线性衰减的转变。以上结果说明Si掺杂能够填充InGaAs SQDs的表面态，并且改变表面费米能级钉扎效应和SQDs的荧光辐射特性。本研究为深入理解与InGaAs SQDs的表面敏感特性关联的物理机制和载流子动力学过程，以及扩大InGaAs/GaAs SQDs传感器的应用提供了实验依据。

A Si doped interlayer was introduced into the GaAs barrier layer to study optical properties of InGaAs/GaAs surface quantum dots (SQDs). Photoluminescence (PL) measurements show that luminescence of InGaAs/GaAs SQDs is strongly dependent on Si doping concentration. With increasing the Si doping concentration, InGaAs/GaAs SQDs show clearly different luminescence characteristics, including: PL peak position of SQDs shifts to red at first and then to blue; the dependence of PL peak energy on the cubic root of excitation intensity changes from linear to nonlinear; configuration interaction method shows reduced blue shift for PL band; time-resolved PL indicates a transition from nonlinear decay of type-II QDs to linear decay of type-I QDs. These experimental results indicate that Si doping fill the surface states and modify the surface Fermi level pinning effect, thus changing the luminescence characteristics of InGaAs/GaAs SQDs. This research provides a support for understanding and tailing the surface-sensitive characteristics of InGaAs SQDs for development of sensors.