针对纳米压印过程中压印胶填充率低导致图案转移质量不佳，压印力过大损坏模板表面形貌等问题，提出一种基于压电驱动低频、低幅的振动辅助纳米压印方法制备光栅结构。在压印时施加横向一维振动，减小纳米压印过程中所需的压印力，提高压印胶对模板空腔的填充率。为研究双面光栅薄膜的周期变化对透射率的影响规律，运用时域有限差分法在波长500~1 500 nm范围内对不同周期参数的双面光栅结构进行仿真分析，得到周期参数变化对透射率的影响规律。在研制的振动装置上进行振动辅助纳米压印实验，并对制备出的双面光栅结构进行表面形貌表征以及透射率检测。实验结果表明，与无振动纳米压印技术相比，压印胶填充率显著提高，并改善了图案转移质量，减少大面积表面缺陷。在波长500~1 500 nm范围内，涂覆振动辅助纳米压印制备的双面光栅薄膜的SiO₂比传统纳米压印制备的双面光栅薄膜的SiO₂平均透射率提高4%，较无薄膜的SiO₂平均透射率提高6%。

To solve the problems of the low filling rate of the photoresist leads to poor pattern transfer quality, and excessive imprinting force damages the surface morphology of the template in the nanoimprinting process. A low-frequency and low-amplitude vibration-assisted nanoimprinting method based on piezoelectric driving is proposed. This method is used to prepare grating structures. Applying lateral one-dimensional vibration reduces the imprinting force required for nanoimprinting and improves the filling rate of the photoresist to the template cavity in nanoimprinting process.To study the influence of the periodic change of the double-sided grating film on the transmittance, the Finite Difference Time Domain (FDTD) method is used to simulate and analyze the double-sided grating structure with different period parameters in the wavelength range of 500~1 500 nm. The influence law of period parameter on transmittance is obtained. When all the dimension parameters of the grating structure are constant, the smaller the upper surface grating period, the larger the lower surface grating period, and the higher the average transmittance. The double-sided grating structure is selected to prepare the upper surface grating period of 800 nm, and the lower surface grating period of 1 800 nm. Study the mechanism of vibration effect on photoresist filling by establishing a mathematical model of vibration-assisted nanoimprint. The variation law of the filling rate with the vibration parameters after the vibration is introduced by the simulation simulation. Simulation results show that the vibration frequency has almost no effect on the filling rate when the vibration amplitude is constant. As the vibration amplitude increases, the filling rate first increases and then decreases. Through simulation analysis, the frequency of 100 Hz and the amplitude of 300 nm are selected as the vibration parameters of the upper surface grating. The frequency of 100 Hz and the amplitude of 600 nm are selected as the vibration parameters of the lower surface grating. The vibration-assisted nanoimprinting experiment is carried out on the developed vibration device. Characterize the surface topography of the double-sided grating structure, and perform the transmittance test. Experimental results show that compared with vibration-free nanoimprinting lithography technology, the filling rate of photoresist is significantly improved. It also improves the quality of pattern transfer and reduces large-area surface defects. The height of the grating prepared by applying vibration is basically the same as the height of the template cavity. It is confirmed that the filling rate of the photoresist is significantly improved after vibration applying, and the surface topography of the grating is improved. By the transmittance detection, compared with SiO₂ without film, the average transmittance of SiO₂ with double-sided grating film prepared by vibration-assisted nanoimprinting is increased by 6% in the wavelength range of 500~1 500 nm.