为保证大口径离轴三反消像散（Three-Mirror Anastigmat，TMA）光学系统在轨成像质量，探明离轴TMA系统中次镜位姿与主镜及三镜面形误差补偿机理，以矢量像差理论为基础，用Zernike多项式表述离轴TMA系统镜面面形误差，并对系统镜面面形误差进行解析。通过分析发现，位于非光阑位置三阶彗差经光瞳坐标变换衍生出与视场线性相关像散；提出结合失调离轴系统矢量像差校正解析式，以系统出瞳波像差RMS值为评价标准，构建离轴TMA系统像差补偿模型，利用次镜位姿对主镜及三镜存在面形误差的离轴TMA系统进行补偿。仿真实验表明：系统主镜存在0.5λ像散与彗差时，所构建像差补偿模型可将系统出瞳波像差由0.18λ补偿至0.08λ；系统三镜存在0.05λ像散与彗差时，可将出瞳波像差由0.3λ补偿至0.1λ，且当三镜面形误差在（−0.03λ，0.03λ）范围内时，可将系统各视场RMS值补偿至系统设计值，使系统成像质量满足要求，为大口径反射式空间望远镜在轨主动装调提供进一步理论指导。

To meet the increasing market demand for optical components, Plasma Jet Machining (PJM) of Borosilicate Crown Glass (BCG), which can be an alternative to Fused Silica, is presented. Surface figure error correction was performed by applying reactive plasma jet etching, where a fluorine-containing microwave driven plasma jet is employed to reduce the figure error in a deterministic dwell-time controlled dry etching process. However, some of the glass constituents of BCG cause the formation of a residual layer during surface treatment which influences the local material removal. By heating the substrate to about T_S = 325 °C to 350 °C during processing, the etching behavior can clearly be improved. Geometric conditions of the optical element nevertheless lead to a characteristic temperature distribution on the substrate surface, which requires an adjustment of the local dwell times in order to obtain the required material removal. Furthermore, the resulting local surface roughness is also influenced by the surface temperature distribution. It is shown that figure error can be significantly reduced by taking the local temperature distribution and resulting local etching rates into account. A subsequent polishing step smoothens roughness features occurring during etching to provide optical surface quality.To meet the increasing market demand for optical components, Plasma Jet Machining (PJM) of Borosilicate Crown Glass (BCG), which can be an alternative to Fused Silica, is presented. Surface figure error correction was performed by applying reactive plasma jet etching, where a fluorine-containing microwave driven plasma jet is employed to reduce the figure error in a deterministic dwell-time controlled dry etching process. However, some of the glass constituents of BCG cause the formation of a residual layer during surface treatment which influences the local material removal. By heating the substrate to about T_S = 325 °C to 350 °C during processing, the etching behavior can clearly be improved. Geometric conditions of the optical element nevertheless lead to a characteristic temperature distribution on the substrate surface, which requires an adjustment of the local dwell times in order to obtain the required material removal. Furthermore, the resulting local surface roughness is also influenced by the surface temperature distribution. It is shown that figure error can be significantly reduced by taking the local temperature distribution and resulting local etching rates into account. A subsequent polishing step smoothens roughness features occurring during etching to provide optical surface quality.

为降低子镜促动器负载，保证拼接式主镜的面形精度和稳定性，针对子镜组件进行了一体优化设计。根据子镜组件设计要求初步确定了子镜的结构形式，基于反射镜背部三点支撑方案提出了一种开槽横梁多轴柔性支撑结构。为解决组件一体优化设计中引入变量过多，不易收敛的问题，设计了一种基于多岛遗传与梯度优化的组合优化算法。建立了以结构重量、面形精度为目标的优化模型，对子镜组件进行了一体设计、工程分析及试验验证。工程分析结果表明：子镜组件结构重量为1.74 kg，X、Y、Z三个方向上的基频均在400 Hz以上，面形精度均控制在5 nm以内。最后对子镜面形进行了检测，结果显示：子镜面形精度的RMS值为0.019λ（λ=632.8 nm），满足优于λ/50的设计要求，验证了设计和分析的准确性，表明针对子镜组件的一体优化设计方法是合理的，为空间相机反射镜支撑结构组件级一体化设计提供了新思路。