同轴两反光学系统杂散光分析及内遮光罩优化设计

针对某同轴两反光学系统的空间布局特点设计了内遮光罩，并对内遮光罩不同的高度和直径参数进行了系统的杂散光分析，绘制了系统东西方向和南北方向的点源透射率(PST)曲线并得到系统像面处的辐照度，从而为内遮光罩的杂散光抑制能力提供了量化的对比结果，便于内遮光罩进行优化设计。通过杂散光分析，并对内遮光罩的结构强度等参数进行有限元分析(FEA)校核，确定了该口径为320 mm的同轴两反光学系统的内遮光罩高度为100 mm，直径为44.8 mm，使得该遮光罩结构在满足空间遥感器力学性能的要求下达到杂散光抑制的最佳效果，实现了杂散光分析及基于结构FEA的优化设计。

Abstract

The inner light baffle is introduced due to the layout of coaxial two reflect mirror system for stray light elimination. Different point source transmittance (PST) curves of the system are gained by changing diameter and height of the inner photomask which is quite useful for optimization of the inner photomask. By stray light analysis and finite element analysis (FEA), it′s ascertained the diameter of the inner photomask is 44.8 mm and the height is 100 mm, then great suppression effectiveness for infrared stray radiation is achieved together with required mechanical capability for the coaxial two reflect mirror system with an aperture of 320 nm.

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林剑春, 孙丽崴, 陈博洋, 王威, 范冰清, 陈凡胜. 同轴两反光学系统杂散光分析及内遮光罩优化设计[J]. 中国激光, 2013, 40(1): 0116001. Lin Jianchun, Sun Liwei, Chen Boyang, Wang Wei, Fan Bingqing, Chen Fansheng. Stray Light Analysis of a Coaxial Two Reflect Mirror System and Optimized Design of Inner Photomask[J]. Chinese Journal of Lasers, 2013, 40(1): 0116001.

同轴两反光学系统杂散光分析及内遮光罩优化设计

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