激光与光电子学进展, 2018, 55 (10): 103102, 网络出版: 2018-10-14   

光学膜厚的监控方法 下载: 806次

Monitoring Method of Optical Film Thickness
作者单位
1 重庆理工大学机械工程学院, 重庆 400050
2 国网重庆市电力公司电力科学研究院, 重庆 401123
摘要
提出了一种提高光电极值法中膜层厚度监控精度的新方法。通过提高判读点的精度, 避免了光学极值法中停镀时存在的随机误差; 通过算法的处理, 将监控信号和光学厚度间的非线性关系转变成了线性关系, 并推算出最佳起判时间, 避免了监控薄膜沉积时非线性误差对极值点判别的影响。
Abstract
A new method is proposed to improve the monitoring accuracy of the thin film thickness in the photoelectricity extremum method. By improving the accuracy of the interpretation points, the random errors occurred when film coating is stopped in the optical extremum method are avoided. The nonlinear relationship between the monitoring signals and the optical thickness is transformed into a linear one and the optimum starting time is deduced by the treatment with algorithms, which avoids the influence of the nonlinear errors on the discrimination of extreme value points in the process of the monitoring thin film deposition.
参考文献

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庄秋慧, 王三强. 光学膜厚的监控方法[J]. 激光与光电子学进展, 2018, 55(10): 103102. Zhuang Qiuhui, Wang Sanqiang. Monitoring Method of Optical Film Thickness[J]. Laser & Optoelectronics Progress, 2018, 55(10): 103102.

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