红外与激光工程, 2022, 51 (9): 20220457, 网络出版: 2023-01-06   

非球面光学表面缺陷检测技术现状和发展趋势(特邀) 下载: 616次

Current situation and development trend of aspheric optical surface defect detection technology (invited)
作者单位
1 中国科学院光电技术研究所,四川成都 610209
2 中国科学院大学,北京 100049
摘要
非球面光学元件具有更大的自由度和灵活性,广泛应用在航空航天、微电子装备、光学精密测量、激光光学等诸多领域。光学元件表面缺陷将影响光学系统性能,而表面缺陷控制需要相应检测手段,高分辨率、高精度、高效率光学表面缺陷检测仍存在技术挑战。文中综述了光学元件表面缺陷类别、评价标准及检测方法,重点探讨了非球面光学元件表面缺陷检测技术及其应用范围,分析比较了各种方法的优缺点,最后对表面缺陷检测技术发展趋势进行了展望。
Abstract
Aspheric optical elements have greater freedom and flexibility, and are widely used in aerospace, microelectronic equipment, optical precision measurement, laser optics and many other fields. The surface defects of optical elements will affect the performance of optical systems, and the control of surface defects requires corresponding detection methods. There are still technical challenges in the detection of optical surface defects with high resolution, high accuracy and high efficiency. This paper summarizes the types, evaluation standards and detection methods of surface defects of optical elements, focuses on the surface defect detection technology of aspheric optical elements and its application range, analyzes and compares the advantages and disadvantages of various methods, and finally prospects the development trend of surface defect detection technology.

0 引 言

非球面光学元件指从元件的中心到边缘,曲率连续发生变化的元件[1-3],按照面形的不同,分为旋转对称和非旋转对称非球面[2],它可以满足一些理论上相互制约的设计需求,从而达到更高的成像质量,提高系统的整体实用性[4-10]。非球面光学元件因具有良好的光学性能而日渐成为一种十分重要的光学元件。

非球面光学元件作为光学元件中一个重要分支,广泛应用在航空航天、微电子装备、光学精密测量、激光光学等领域。光学元件在制造、清洗和运输等环节中,除了本身气泡暴露以及加工过程中不当操作,或者外在因素损伤,均可能形成表面缺陷。缺陷的存在会降低光束质量、破坏膜层、造成元件损伤[11-15],例如,美国国家点火装置(NIF)、法国兆焦耳激光装置以及我国研制的高性能高功率的神光系列装置等大型激光系统中涉及到的光学元件,如果出现一个微小的缺陷都可能导致灾难性的破坏,所以表面缺陷检测对工艺优化改进和系统质量控制至关重要[16-17]。激光光学、X 射线光学、微电子装备等先进光学系统性能不断升,驱动着缺陷检测技术及仪器不断发展,缺陷检测精度要求也随之提高。由于非球面面形复杂程度更高、制造工艺更为复杂,因此未来重点突破大口径、离轴、非球面度大的曲面超精密表面缺陷高精度定量检测,实现高精度、高分辨、多种方法交叉融合检测以及制造研发专用的检测设备仍是一项技术挑战。

文中回顾了非球面光学元件表面缺陷检测技术的发展历程,简述了表面缺陷的类型及标准,重点讨论了已有各类缺陷检测方法,分析对比了各检测技术的优缺点与适用范围、研究进展与应用情况,介绍了高精度表面缺陷检测仪器,从而展望了非球面表面缺陷检测技术的发展趋势。

1 光学元件表面缺陷类别、标准及检测方法

光学元件表面缺陷主要指表面疵病和表面污染物[18],表面疵病指在光学元件生产加工过程中,由于操作不当等原因产生的麻点、划痕、擦痕、破边、气泡等典型缺陷[19-21],见表1。为了对不同类型缺陷进行合理评价,很多国家和国际标准化组织都提出了相应的光学元件表面缺陷评价标准,主要有国际标准ISO 10110-7《光学和光学仪器光学零件和光学系统图样第7部分: 表面疵病公差》[22]、国家标准GB/T 1185—2006《光学零件表面疵病》[23]、美国军用规范MIL-PRF-13830 B《火控仪器光学零件制造、装配和检验通用技术条件》[24-25]。在这些主流的光学元件表面缺陷标准中,划痕和麻点为主要缺陷类别,缺陷标准及标准板图样见图1,最高要求为划痕宽度1 μm,麻点直径4.5 μm。根据这些标准,可以让不同检测人员间有相同检测依据,这在高精度光学元件缺陷检测,以及光学元件的生产、加工、制造中都极具科研意义。

表 1. 典型表面缺陷类型[12,22-29]

Table 1. Typical surface defect type[12,22-29]

Defect typeDigScratchBroken edgeBubble
Appearance
ISO 10110-7Length<2 mmLong scratch length>2 mmDescription requirements to be metGas not discharged in time during production and processing
GB/T 1185-2006Rough pockmarks corresponding to basic series of tolerance Aspect ratio of long scratches>160:1
MIL-PRF-13830 BA maximum size pockmark is allowed in the 20 mm area Maximum size: total scratch length≤One quarter of the element diameter Ignored when not entering the effective apertureOne is allowed in the area with optical diameter of 20 mm

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图 1. (a) 缺陷ISO、GB标准;(b) 缺陷标准板图样(划痕和麻点)

Fig. 1. (a) ISO, GB standards; (b) Defect standard plate drawings(scratches and digs)

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光学元件表面缺陷检测是决定光学系统成像质量好坏的关键因素之一[30],目前,国内外研究机构对缺陷检测技术开展了大量研究,国外有针对性地在部分领域内搭建了专用设施系统,但关于惯性约束聚变、光刻等复杂系统的商业化应用还有待进一步研究。国内的部分高校及科研院所对缺陷检测方法进行了基础理论研究和应用验证,比如浙江大学实现了大口径光学元件表面疵病的自动评价,所研制的缺陷检测设备在神光系统中有所应用[31-34];中国科学院自动化研究所基于机器视觉、深度学习等手段进一步推动了视觉缺陷检测的进步与应用[35-38];中国科学院光电技术研究所针对中小口径平面元件研制的表面缺陷检测仪器精度达亚微米量级,曲面元件检测精度达微米量级[39-42];中国科学院上海光学精密机械研究所针对光学元件表面缺陷定量检测技术和仪器研制取得重要进展,检测口径可达米级[43-45];中国科学院长春光学精密机械与物理研究所对平面及曲面元件进行了表面缺陷检测实验研究,并搭建了相应的检测装置[46-49];成都精密光学工程研究中心[50-51]也进行了大量的测试研究和应用验证;部分公司对缺陷检测仪器进行了研制,比如合肥知常光电科技公司[52]基于显微成像和散射原理,研制了针对不同口径和面形的光学元件缺陷自动化检测装置,杭州晶耐科公司研制了小型超光滑、超光滑大口径、超光滑表面疵病数字化检测仪[53-55]。表面缺陷检测方法主要分为接触式和非接触式[56],如表2所示。接触式检测方法通常可以得到缺陷的三维信息,非接触式检测方法一般获得缺陷的二维信息,但也有部分方法可以得到缺陷三维信息。检测人员通常会采用增加显微镜放大倍率、提高照明光源亮度或改变照明条件等方式,实现对尺寸极其微小的缺陷的检测[57-58]

表 2. 表面缺陷检测方法[59-174]

Table 2. Surface defect detection methods[59-174]

Test methodAdvantageDisadvantageDefect information
Contact type Scanning probe surface profilometer; Atomic force microscope Up to pm level vertical resolutionSlow speed, not suitable for large diameter components3D
Non contact type Interference methodLaser/White light interferometerVertical resolution up to 0.1 nmComplex fringe demodulation and low lateral resolution 3D
Differential interference differenceHigh resolutionComplex technical design3D
Optical coherence chromatographyGood depth resolutionLow horizontal resolution3D
Diffraction methodSimultaneously detect the defect type and size Not universal2D
Scattering method Visual methodSimple and fast operationLow accuracy and great subjective influence 2D
Virtual image superposition comparison methodHigher accuracy than visual method Great subjective influence2D
Filtering imaging detection method FastLow resolution2D
Infrared detection methodEasyLow accuracy, affected by environment 1D
Dark field scattering imagingThe results are intuitive and have good contrast It needs splicing detection and takes a long time 2D
Bright field scattering imagingThe results are intuitive and the resolution is high Slow2D
Non contact type Scattering method Laser scattering confocal microscopyClear imaging and high system resolution Complex device and low efficiency 3D
Photothermal deflection microscopy High accuracyLow efficiency3D
Total internal reflection methodThe obtained dark field image is easy to process Small imaging space angle3D
Fringe reflection methodSimple device and high sensitivity Suitable for small area measurement3D
Scattered light energy analysis method The scattering characteristics of defects are obtained accuratelyThe location and number of defects cannot be accurately obtained. 2D
Laser spectrum analysisThe device is simple and easy to operate Disturbed by defective deep structure 2D

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2 非球面表面缺陷检测方法分类

在现有表面缺陷检测方法中,由于使用条件的限制,并不是所有的方法都适用于非球面光学元件,在对非球面表面缺陷进行检测时,主要采用以下方法(见表3)。

表 3. 非球面表面缺陷检测方法[59-174]

Table 3. Aspheric surface defect detection methods[59-174]

Test methodScope of applicationSketch map
Contact typeScanning probe surface profilometer; Atomic force microscopeIt is difficult to detect high steepness and large-size curved surface components; It needs to be customized when testing aspheric surfaces
Non contact typeInterference methodInterference microscope; Laser interference profilometer; White light interferometer It is mainly used for small and medium diameter and steep curved surface components
Diffraction methodDiffraction pattern method It is mainly used for aspheric surface defects with regular morphology
Scattering methodImaging methodVisual methodLow detection accuracy of aspheric surface defects.
Laser scattering confocal microscopyIt is difficult to detect the surface defect of complex surface
Non contact typeScattering methodImaging methodBright field /Dark field scattering imagingIt is mainly used for two- dimensional inspection of aspheric surface defects
Fringe reflection methodThree dimensional inspection of aspheric surface defects
Non imaging methodScattered light energy analysis methodTotal integral scattering methodIt is difficult to determine the location and size of defects
Angular resolution scattering method
Laser spectrum analysisIt is often used for aspheric defects with regular structure

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2.1 接触式非球面表面缺陷检测方法

接触式非球面表面缺陷检测方法需借助扫描探针式表面轮廓仪、原子力显微镜等进行检测[60]。扫描探针式表面轮廓仪通过探针在表面滑动扫描,表面形貌产生相应调制,得到元件表面缺陷的三维信息,具有测量精度高的优点,但触针易磨损、环境要求严苛、多用于长曲率半径的曲面光学元件[61-63]。原子力显微镜通过检测待测元件表面和探针针尖间极微弱的原子间相互作用力,得到悬臂产生的位移形变来对元件表面结构进行测量,该仪器检测精度高,不需对样品进行特殊处理,但成像范围小,速度慢,检测高陡度的曲面元件难度大[64-67]。接触式检测法可以达到纳米量级的纵向分辨率,但接触式与待测元件表面距离过短,容易造成二次损伤[68],部分研究人员对此进行了改进,天津大学提出光学针描法的测量技术,采用光触针代替机械触针[62];中国民航大学设计了光纤探针式轮廓仪,采用光纤探针检测待测元件表面[63];中国科学院北京电子显微镜实验室研制了检测镜面高频粗糙度的激光原子力显微镜[65-66];江西省科学院探测到纳米级表面微观缺陷[67]。虽然改进后造成的二次损伤减少,但仍存在检测成本高、效率较低的缺点,大尺寸、高陡度的曲面光学元件检测难度大。

2.2 非接触式非球面表面缺陷检测方法

从20世纪80年代开始,光学元件表面缺陷的非接触检测受到国内外学者的重视,经过多年研究,已经提出多种不同的检测技术和方法,主要采用光学法[69],具体可分为干涉法、衍射法和散射法[56],一些检测技术仅适用于理论研究或实验室研究,并不能在实际中得到应用,但也有部分机构单位研制出了光学元件表面缺陷的检测仪器和设备。

2.2.1 干涉法

干涉法是一种高精度的缺陷检测方法,它基于光波的干涉原理,见图2,通过干涉条纹的移动变化得到缺陷折射率的微小变量,从而对缺陷进行检测[70-73]。比如激光干涉轮廓仪、白光干涉仪等,通过选择不同的光源实现缺陷的三维检测。国内外的一些院校单位如美国WYKO公司[68]、北京理工大学[74]、浙江大学[75-76]及其他单位[77-83]采用干涉法对光学表面缺陷进行了检测,达到纳米量级的纵向分辨率和微米量级的横向分辨率,实现了快速、准确和可重复的表面缺陷三维检测。干涉法的优点在于可以检测出微损伤的深度信息,但干涉条纹会在微损伤处发生断裂,解调方法复杂,横向分辨率有限,大口径曲面元件检测难度大。

图 2. 干涉法检测原理

Fig. 2. Detection principle of interferometry

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2.2.2 衍射法

衍射法[56]是指通过一束正入射的光照在待测元件表面,在透射表面得到衍射图样,根据衍射图样对缺陷信息做进一步分析。其中,最具代表性的是衍射图样法[84],见表4。美国的Klingsporn P E[85]、清华大学的武勇军等人[86]均实现了采用衍射图样法对缺陷进行检测。衍射图样法通常采用激光或相干性较好的平行光,能够同时检测出缺陷的种类和大小,但这种方法依靠衍射图样来确定缺陷的形貌,多适用于形貌规则的非球面表面缺陷,应用范围并不广泛。

表 4. 衍射图样法检测不同形貌缺陷[86]

Table 4. Detection of defects with different morphologies by diffraction pattern method[86]

Diffraction pattern methodLinear scratchDigBubble
Light diffraction pattern

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2.2.3 散射法

缺陷会使元件表面产生折射率突变,表5中分别描述了同轴和离轴时的散射情况。当一束平行光入射到待测元件表面时,若表面存在缺陷,缺陷会使光线发生偏折变为散射光,从而相机可以看到呈现出的缺陷图案[87]。多数的缺陷检测方法都是基于缺陷的散射机理,德国弗劳恩霍夫协会Hauptvogel等人[88]证明即使是微弱缺陷也能采用光散射法精确检测,该方法在非接触、高效、灵敏地检测表面缺陷具有很高的潜力。在缺陷检测方面,浙江大学现代光学仪器国家重点实验室利用显微暗场散射成像技术配合子孔径扫描拼接,实现了1 000 mm×600 mm大口径平面光学元件表面疵病的自动评价;针对大口径非球面光学元件表面缺陷检测的对心、多位控制、数据处理等关键技术,实现了高精度、自优化、自动化检测;此外,该团队在表面缺陷基础上,将被检缺陷范围扩大到了亚表面缺陷以及体缺陷,对缺陷检测的成像、检测系统及仪器、图像处理算法、照明方式、双通道图像采集系统等方面取得了一系列的突破[84,89-95]。为了提高缺陷检测的效率、扩大缺陷检测的视场范围、减小检测仪器对待测元件的二次伤害,研究人员们不断寻找着非接触式的散射缺陷检测方法,主要分为成像法和非成像法[96]

表 5. 不同方式下散射法检测表面缺陷原理

Table 5. Principle of surface defect detection by scattering method under different modes

ModeNon-defectiveDefective
Bright field scattering imaging (coaxial)
Dark field scattering imaging (off-axial)

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2.2.3.1 非成像缺陷检测法

1988年,前苏联科学家格列波聂夫等人[97]根据接收到的缺陷散射光能量实现了表面缺陷检测。散射光能量分析法和激光频谱分析法是散射法中的非成像法(见表6),根据探测到表面缺陷所产生的散射光,对散射光能量的强度和分布进行分析,实现对缺陷的定量检测[49]。散射光能量分析法主要包括以标量散射理论为基础的全积分散射法和以矢量散射理论为基础的角分辨散射谱法[98],德国Fraunhofer IOF研究所研制了ALBATROSS-TT能够用于表面的散射测量,具有检测速度快,结构简单的优点,但检测结果并不直观,不能准确确定非球面缺陷的具体位置和形貌。激光频谱分析法在原理上比较严谨,但易受缺陷深层结构的干扰,检测精度较低,难以实现扫描效率和精度的平衡。

表 6. 非成像缺陷检测方法[98-109]

Table 6. Non imaging defect detection methods[98-109]

Scattered light energy analysisLaser spectrum analysis
MethodTotal integral scattering methodAngle resolved scattering spectroscopyLaser spectrum analysis
Sketch Map
PrincipleAn integrating sphere is used to collect the scattered light from the surface of the optical element and integrate the energy The light intensity and its distribution of scattered light are used to measure the surface roughness parameters. The intensity distribution of backscattered light from surface defects of different structures was detected and evaluated.
FeatureSimple structure, fast measurement speed, not easily affected by the environment; However, it is impossible to accurately obtain all the characteristic information of defects and the spatial distribution of scattered light The spatial distribution of scattered light and the total surface integrated scattering value can be obtained accurately; However, the structure is complex, the cost is high, and it is easy to be affected by the environment Simple structure and easy operation; However, it is easy to be disturbed by the deep structure of defects and difficult to achieve the balance between scanning efficiency and accuracy

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2.2.3.2 成像法

国内外关于非球面光学元件表面缺陷定量化检测方法中,发展最为迅速和成熟的是散射成像法,如图3所示。

图 3. 成像法[23,30,49,56,134]

Fig. 3. Imaging method[23,30,49,56,134]

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目视法是最为传统和应用最为广泛的典型成像法,检测人员在一定的照明条件下,通过人眼直接对非球面元件进行观察并判断缺陷,将待检元件表面上观察到的缺陷与缺陷标准板上的缺陷样本进行比对,从而实现缺陷的检测和分级。它因装置简单、成本低,目前在光学车间广泛使用,但这种方法的检测结果受限于人眼分辨能力和检测人员的主观判断,检测结果可靠性较低,数据传递和质量追溯较难,并不能够给出准确的非球面表面缺陷检测结果[49]

为了提高目视法的观测灵敏度,在其基础上加入一个放大镜,形成了虚像叠加比较法[23,110]。将待检元件放置在放大镜的前焦点处,元件成正立的虚像,人眼直接观察所成的像,并将结果与标准板的样本作比较,从而对非球面缺陷进行评价,虽然精度相较于目视法有了一定程度的提高,但检测过程依旧利用人眼进行检测,仍会受主观判断的影响,存在着较大误差。

在直接散射的基础上,发展出了明场/暗场散射成像法[118]。平行光入射到待测元件表面后,缺陷会对入射光产生调制作用并得到散射像,变焦显微镜只采集在缺陷处产生的散射光,CCD采集散射像,进一步获得缺陷的信息[119]。为了进一步提高明场/暗场散射成像法的检测精度,国内外做了一些相关研究[120-125],如表7所示。明场/暗场散射法具有灵敏度高、精度高、分辨率高、对比度高的优点,能够有效地检测到非球面表面划痕、麻点等缺陷,区分深度达数nm量级的缺陷,实现了对光学元件表面缺陷的综合性检测。

表 7. 明场/暗场散射成像相关研究[44,49,120-125]

Table 7. Research on bright field /dark field scattering imaging[44,49,120-125]

TeamMain achievementsSketch map
University of Jena HorstA device for measuring the scattered light distribution of different defects is designed. The height distribution of defects is obtained by contour measurement, and the automatic detection of defects is realized
Japan Extreme Ultraviolet Lithography Infrastructure Development CenterA photochemical full field detection system is proposed to measure the phase defects of 20 nm in the transverse direction and 1.1 nm in the longitudinal direction
Xi'an Technological UniversityThe light source is incident at an angle of 40°-60°
Zhejiang UniversityBased on the dark field illumination mode, a curved surface defect detection device using a high brightness variable aperture angle LED ring light source has an imaging resolution of 8 μm
Sichuan UniversityCircular aperture microscopy (CAM) was proposed
Shanghai University of TechnologyCombining dark field scattering and curvature imaging to realize comprehensive detection of optical surface defects
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of SciencesUsing the bright field illumination scheme, a dark field illumination experimental device was built using two laser diodes to detect the surface defects of concave spherical mirrors
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of SciencesA high-speed laser line scanning surface defect detection device with high sensitivity and signal-to-noise ratio is developed for large caliber and heavy weight samples
Institute of Optics and Electronics, Chinese Academy of SciencesA defect detection device for 150 mm curved surface optical element is developed, which can detect weak scratches

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随着光学传感器件的日益成熟和计算机图像技术的不断发展,以显微成像为代表的数字化检测法以其非接触、高分辨率、量化评估等优点成为了缺陷定量检测领域的重要手段。激光散射共聚焦显微法使用扫描器对非球面表面进行逐点扫描,将探测收集到的光束信号传输至计算机进行处理[56],相关研究(表8)[126-128]表明该方法可得到非球面表面缺陷位置和尺寸,成像精度高,分辨率高,是一种能够精确检测表面缺陷并适应超精密光学制造流程的有效手段,对曲面微米级甚至亚微米级尺度、几纳米到几十纳米深度微弱缺陷的检测是该技术的关键难点。

表 8. 激光散射共聚焦显微法相关研究[126-128]

Table 8. Research on laser scattering confocal microscopy[126-128]

TeamMain achievementsSketch map
Tongji UniversityThe light scattering method is combined with laser confocal scanning to quickly distinguish micro cracks and scratches
Xi'an Technological UniversityIt combines optical confocal imaging, tomography, micro optics, optical scattering and weak signal processing to realize quantitative and non-destructive detection of optical element defects
Dalian University of TechnologyThe polarization laser scattering method and the laser scattering confocal method are combined to obtain the three-dimensional defect information by changing the different positions of the focus of the micro objective lens in the element to be measured

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2.2.3.3 条纹反射法检测非球面表面缺陷

条纹反射法作为一种高效检测非球面元件的成像法,在元件的三维形貌测量基础上,实现了对表面缺陷的三维检测。检测系统仅需显示屏、相机及计算机,如图4所示,LCD显示屏显示编码好的水平和垂直方向的标准条纹图,将条纹图投射到待测元件表面,若表面存在缺陷,反射条纹图会发生变形并被相机接收,通过相位解算及梯度积分重建,实现对表面缺陷的三维检测。

图 4. 条纹反射法。(a) 测量原理示意图[134] ;(b) 实验装置图[168]; (c) 检测流程图[135]

Fig. 4. Fringe reflection method. (a) Schematic diagram of measurement principle[134]; (b) Diagram of experimental device[168]; (c) Flow chart of detection[135]

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表面缺陷所引起的相位变化为[135]

$\begin{split} \\ \Delta \varphi = \varphi - {\varphi _s} = (2\text{π} d/p)\tan 2\alpha \end{split} $ (1)

缺陷的深度信息S与变化角度 $ \alpha $之间的关系为[135]

$ \frac{{\partial S\left( {x,y} \right)}}{{\partial x}} = \tan {\alpha _x} \text{,} \frac{{\partial S\left( {x,y} \right)}}{{\partial y}} = \tan {\alpha _y} $ (2)

式中:p为条纹周期; $ {\varphi _0}\left( {x,y} \right) $为附加调制相位;d为元件表面与显示屏之间的距离。

条纹反射法发展历程见图5,目前,采用条纹反射法检测非球面成为研究热点,许多高校和科研院所进行了大量研究,比如四川大学、南京理工大学、中国科学院光电所等。四川大学苏显渝、张启灿等人[144-153]对条纹反射法进行了大量研究,包括相位展开和三维形貌重建两个核心算法,所研究的方法和结果为缺陷三维检测提供了重要参考价值。光电所[135,154-155]、电子科技大学[156-160]、天津大学[161-166]等其他院校[134,167-171]进行了光学表面缺陷检测的研究,目前能够检测到亚微米级的缺陷深度。可见,条纹反射法分辨率较高,装置及操作简便,是表面缺陷三维检测中十分有潜力的手段,一次检测能够获得相位、梯度、缺陷尺寸等信息,实现了多通道检测(表9)。将条纹反射法应用到非球面元件表面缺陷三维检测中,为评价光学元件提供了更加可靠的参考依据。将机器视觉、神经网络等技术与条纹反射法相结合将会进一步优化检测过程,有效提高检测精度和效率,这具有重要的研究意义和价值。

图 5. 条纹反射法发展历程[136-153]

Fig. 5. Development history of fringe reflection method[136-153]

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表 9. 条纹反射法表面缺陷多通道检测[135]

Table 9. Multi channel detection of surface defects by fringe reflection method[135]

Light intensityGradientDefect depth measurement
Horizontal
Vertical

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2.3 高精度表面缺陷检测仪器现状

为了实现缺陷的快速、自动化和数字化检测,国内外先后研制出了性能优异的光学元件表面缺陷检测仪器[38,52,175-177],见图6,这些仪器主要采用显微成像法或激光散射法。与平面光学元件相比,曲面元件(特别是非球面)缺陷检测技术和仪器仍处于发展阶段。国外所研制的曲面缺陷检测仪器比如美国Savvy Inspector TM SIL-4和德国DIOPTIC的ARGOS2主要用于检测平面和小相对口径曲面元件表面缺陷[175-177],德国弗朗霍夫研究所IOF研制的horos传感器可直接集成到光学制造过程中进行质量控制;近年来,国内也研制出多种规格的曲面缺陷检测仪器,其分辨率可达到微米级[52-55,177],目前主要处于优化改进和应用验证阶段。未来针对大口径大相对口径非球面光学元件表面缺陷的高分辨、高效率和高精度检测仍是重要发展方向。

图 6. 表面缺陷检测仪器[38,52,175-177]。 (a) 美国Savvy Inspector TM SIL-4; (b) 德国ARGOS2(c) 德国horos; (d) 知常光电全自动缺陷检测系统; (e) 浙江大学大口径元件缺陷检测仪器; (f) 中国科学院自动化所大口径光学玻璃检测装置; (g) 中国科学院光电所表面缺陷检测装置

Fig. 6. Surface defect detection instruments[38,52,175-177]. (a) Savvy Inspector TM SIL-4; (b) ARGOS2; (c) horos; (d) Zhichang photoelectric automatic defect detection system; (e) Large aperture element defect detector of Zhejiang University; (f) Large aperture optical glass detection device of Institute of Automation, Chinese Academy of Sciences; (g) Surface defect detection device of Institute of Optics and Electronics, Chinese Academy of Sciences

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3 非球面表面缺陷检测技术发展趋势

随着非球面光学元件在重大领域中广泛应用,国内外均对非球面缺陷检测技术进行了大量的研究和相关改进工作,包括基础理论研究、理论仿真分析、实验研究、原理样机研制和缺陷检测仪器研制,不断提高着检测的精度和效率。通过对非球面光学元件表面缺陷检测标准和检测方法归纳,可以看出表面缺陷标准和检测方法的发展趋势如下:

(1) 缺陷检测基础理论进一步完善。随着光学元件面形复杂度以及缺陷检测精度要求不断提高,对缺陷检测中的干涉、衍射、散射和显微成像等基础理论需要进一步更新和完善。

(2) 缺陷完整信息获取。对不同类型表面缺陷进行完整、准确检测;在缺陷二维信息基础上,精确获取缺陷的位置、尺寸、深度、微观形貌等三维信息。

(3) 缺陷标准进一步完善。目前常用标准规范仅能展示缺陷长度、宽度、面积等二维信息,并不能给出深度方面的标准,应扩展现有基于二维信息的缺陷检测标准,开发融合三维信息的缺陷数据库,以对缺陷进行完整客观的描述。

(4) 多传感、多方法融合检测。不同检测方法交叉融合,结合光机、传感技术、运动控制,融合先进光学、图像处理、深度学习等前沿学科相关方法,提高检测结果的可靠性、准确性。

(5) 缺陷检测综合性能再提升。在传统平面和小口径曲面缺陷检测基础上不断拓展应用场景,针对高复杂度的离轴、大偏离非球面表面缺陷检测,实现分辨率、重复精度、准确度、检测效率的进一步提升。

(6) 缺陷检测仪器装备集成创新发展。不断拓展缺陷检测应用场景,融合先进技术关键部件,根据不同需求实现在线、在位、离线等场景灵活部署,整个仪器发展实现集成化、系列化、柔性化、智能化。

4 结 论

文中介绍了光学元件表面缺陷的类型、标准、检测方法及高精度检测仪器,重点讨论了非球面元件表面缺陷检测方法,指出了各检测方法的优缺点及适用范围。由于存在非球面元件面形复杂以及检测仪器视场受限等难题,大口径超精密曲面光学元件表面缺陷的快速高精度定量检测仍是许多应用领域亟待突破的关键技术,建立高效、精密、自动化的检测设备仍需进一步研究。

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