针对高应变InGaAs/GaAs多量子阱中存在的局域态问题，利用金属有机化合物气相外延（MOCVD）技术，设计并生长了五周期的In_0.3Ga_0.7As/GaAs高应变多量子阱材料。通过原子力显微镜（Atomic force microscope，AFM）和变温光致发光（Photoluminescence，PL）测试，发现量子阱内部存在缺陷及组分波动的材料无序性表现，验证了多量子阱内部局域态的存在及起源。同时发现在不同测试位置，局域态在低温下对光谱的影响也不同，分别表现为双峰分布和峰位“S”型变化。这进一步说明材料内部无序化程度不同，导致局域态的深度也不同。依据温度?带隙关系的拟合，提出了包含局域态的多量子阱材料的电势分布，并揭示了局域态载流子和自由载流子的复合机制。并且借助变功率PL测试，研究了在不同激发功率密度下不同深度的局域态的发光特性。

The nano-patterned InGaN film was used in green InGaN/GaN multiple quantum wells (MQWs) structure, to relieve the unpleasantly existing mismatch between high indium content InGaN and GaN, as well as to enhance the light output. The different self-assembled nano-masks were formed on InGaN by annealing thin Ni layers of different thicknesses. Whereafter, the InGaN films were etched into nano-patterned films. Compared with the green MQWs structure grown on untreated InGaN film, which on nano-patterned InGaN had better luminous performance. Among them the MQWs performed best when 3 nm thick Ni film was used as mask, because that optimally balanced the effects of nano-patterned InGaN on the crystal quality and the light output.The nano-patterned InGaN film was used in green InGaN/GaN multiple quantum wells (MQWs) structure, to relieve the unpleasantly existing mismatch between high indium content InGaN and GaN, as well as to enhance the light output. The different self-assembled nano-masks were formed on InGaN by annealing thin Ni layers of different thicknesses. Whereafter, the InGaN films were etched into nano-patterned films. Compared with the green MQWs structure grown on untreated InGaN film, which on nano-patterned InGaN had better luminous performance. Among them the MQWs performed best when 3 nm thick Ni film was used as mask, because that optimally balanced the effects of nano-patterned InGaN on the crystal quality and the light output.

金属有机化学气相沉积(MOCVD)方法制备InGaN/GaN多量子阱结构时, 在GaN势垒层生长的N₂载气中引入适量H₂, 能够有效改善阱/垒界面质量从而提升发光效率。 本工作利用光致发光(PL)光谱技术, 对蓝光激光器结构中的InGaN/GaN多量子阱的发光性能进行了精细的光谱学测量与表征, 研究了通H₂生长对量子阱界面的调控效应及其发光效率提升的物理机制。 室温PL光谱结果显示, GaN势垒层生长载气中引入2.5%的H₂使InGaN/GaN多量子阱的发光效率提升了75%、 发光峰的峰位蓝移了17 meV、 半峰宽(FWHM)减小了10 meV。 通过功率依赖的PL光谱特征分析, 我们对InGaN/GaN量子阱中的量子限制Stark效应(QCSE)和能带填充(Band Filling)效应进行了清晰的辨析, 发现了发光峰峰位和峰宽的光谱特征主要受QCSE效应影响, H₂的引入能够大幅度降低QCSE效应, 并且确定了QCSE效应被完全屏蔽情况下的发光峰能量为2.75 eV。 温度依赖的PL光谱数据揭示了通H₂生长量子阱结构中显著减弱的载流子局域化行为, 显示界面质量提高有效降低了限制势垒的能量波动, 从而导致更窄的发光峰半峰宽。 PL光谱强度随温度的变化规律表明, 通H₂生长并不改变量子阱界面处的非辐射复合中心的物理本质, 却能够显著减少非辐射复合中心的密度, 有助于提升量子阱的发光效率。 通过时间分辨PL光谱分析, 发现通H₂生长会导致量子阱结构中更短的载流子辐射复合寿命, 但不影响非辐射复合寿命。 载流子复合寿命的变化特征进一步确认了通H₂生长对量子阱结构中QCSE效应和非辐射复合中心的影响规律。 综合所有PL光谱分析结果, 我们发现通H₂生长能够提高InGaN/GaN多量子阱的界面质量、 显著减弱应力效应(更弱的QCSE效应)、 降低限制势垒的能量波动以及减少界面处非辐射复合中心的密度, 从而显著提升量子阱的发光效率。 该研究工作充分显示了PL光谱技术对半导体量子结构发光性能的精细表征能力, 光谱分析结果能够为InGaN/GaN多量子阱生长提供有价值的参考。