稳定同位素测量技术已经在地球化学、地球物理、农业、生物、临床医学和生态科学等领域得到了众多应用。相对于传统的稳定同位素分析方法，基于激光吸收光谱技术的同位素分析技术，作为一种较新的同位素丰度测量方法，具有选择性好、精度高、体积小、无需样品预处理、可以实时原位同时测量气体浓度及同位素丰度等众多优点，得到了极大的关注和使用。本文主要以目前同位素测量的可调谐半导体激光吸收光谱技术、积分腔吸收光谱技术、腔衰荡吸收光谱技术三种激光吸收光谱方法为例，阐述了其基本原理、谱线选择、温压影响因素及其控制、系统组成结构以及部分应用测试结果。通过对测量系统的压力与温度的稳定控制的前提下，选取了合适的同位素测量谱线对，实现了大气CO₂气体的¹³C测量精度为0.3‰，煤层气CH₄气体的¹³CH₄测量精度为1.25‰，冰川水H₂O中¹⁸O、¹⁷O和²H的测量精度分别为0.3‰、0.2‰和0.5‰，以及呼吸气体中的¹³CO₂判识“金标准”。通过分析验证了激光吸收光谱技术在同位素测量方面的可行性和可靠性，也充分说明了基于激光吸收光谱技术的测量方法具有非常好的技术优势，将是光谱研究领域关注的重点内容，并在后续的科学研究中占据举足轻重的作用。

Overview: Two-photon lithography (TPL) has been a research hotspot in 3D micro/nano writing technology due to its characteristics of high resolution, low thermal influence, a wide range of processed materials, low environmental requirements, and 3D processing capability. It has shown unique advantages in the fields of life science, material engineering, micro/nano optics, microfluidic, micro machinery, and so on. This paper summarizes the research works done by researchers on different writing methods to improve TPL processing efficiency. Single-beam writing is the main method for TPL, which mainly depends on the speed of the scanning device. Single-beam writing has the advantages of simple system and high-quality beam, and it is easy to combine various effects to improve writing results. It mainly includes scanning modes based on the translation stage, galvo, polygon laser scanner, and acousto-optic deflector (AOD) (Fig. 2). All these modes have advantages and disadvantages. As for the scanning speed comparison, polygon laser scanner and AOD have relatively faster writing rates (faster than m/s). Multi-foci parallel lithography can obviously promote efficiency, elevating the speed by dozens or even hundreds of thousands of times, mainly based on spatial light modulator (SLM), digital micromirror device (DMD), microlens array (MLA), diffractive optical elements (DOE), multi-beam interference, and so on (Figs. 3-15). Multi-foci parallel lithography based on SLM is most widely used owing to its high efficiency and ability to flexible and independent control of each single beam, but the refresh rate is still insufficient. DMD has a higher refreshing rate (32 kHz), but the state-of-the-art beam parallelism realized by DMD is severely limited. More parallel beams are further required for improving the processing efficiency. The 2D pattern exposure method based on SLM or DMD can further improve the TPL efficiency with the superiority of generating flexibly designed pattern (Figs. 16-18). However, the 2D projection exposure technology is still difficult to achieve high writing precision, especially the axial resolution. An available method to improve the axial precision is spatially and temporally focusing an ultrafast laser to implement a strong intensity gradient at the spatial focal plane that restricts polymerization within a thin layer. The 3D projection method will be the most efficient writing method in the future, especially in 3D device processing (Figs. 19-20). Researchers used this technique to make hollow tubular and conical helices structures, increasing the processing speed by 600 times. However, the research results show that the current 3D projection can only process simple 3D structures. Further researches on 3D exposure processing of complex structures are expected, which will effectively expand its application in various fields. Authors believe that with the effort of researchers on efficiency improvement gradually, TPL can further highlight its advantages to promote the development of life science, materials engineering, micro-nano optics, and many other fields.