设计并制作了一款直径为1.1 mm、频率为31.11 kHz的MEMS压电微镜，用于需要高速扫描且小尺寸的应用场景。该器件所需模态为扭转模态，与其他模态分离情况好，不会出现耦合。实验结果显示，电压为32 V时光学扫描角40.66°，品质因子1 155。改变PZT极性，实验得到了薄膜材料的铁电性质影响。另外，完成了MEMS微镜在0 ℃~100 ℃不同温度下角度的变化实验，偏离不超过±1°。仿真模拟、实验结果和理论计算结果三者拟合情况好，表明该设计的微镜具有较高的可控性和稳定性，为实现高精度扫描提供了有力支持。该MEMS压电微镜在AR/VR等领域中具有潜在的应用前景。

Overview: Two-photon lithography (TPL) has been a research hotspot in 3D micro/nano writing technology due to its characteristics of high resolution, low thermal influence, a wide range of processed materials, low environmental requirements, and 3D processing capability. It has shown unique advantages in the fields of life science, material engineering, micro/nano optics, microfluidic, micro machinery, and so on. This paper summarizes the research works done by researchers on different writing methods to improve TPL processing efficiency. Single-beam writing is the main method for TPL, which mainly depends on the speed of the scanning device. Single-beam writing has the advantages of simple system and high-quality beam, and it is easy to combine various effects to improve writing results. It mainly includes scanning modes based on the translation stage, galvo, polygon laser scanner, and acousto-optic deflector (AOD) (Fig. 2). All these modes have advantages and disadvantages. As for the scanning speed comparison, polygon laser scanner and AOD have relatively faster writing rates (faster than m/s). Multi-foci parallel lithography can obviously promote efficiency, elevating the speed by dozens or even hundreds of thousands of times, mainly based on spatial light modulator (SLM), digital micromirror device (DMD), microlens array (MLA), diffractive optical elements (DOE), multi-beam interference, and so on (Figs. 3-15). Multi-foci parallel lithography based on SLM is most widely used owing to its high efficiency and ability to flexible and independent control of each single beam, but the refresh rate is still insufficient. DMD has a higher refreshing rate (32 kHz), but the state-of-the-art beam parallelism realized by DMD is severely limited. More parallel beams are further required for improving the processing efficiency. The 2D pattern exposure method based on SLM or DMD can further improve the TPL efficiency with the superiority of generating flexibly designed pattern (Figs. 16-18). However, the 2D projection exposure technology is still difficult to achieve high writing precision, especially the axial resolution. An available method to improve the axial precision is spatially and temporally focusing an ultrafast laser to implement a strong intensity gradient at the spatial focal plane that restricts polymerization within a thin layer. The 3D projection method will be the most efficient writing method in the future, especially in 3D device processing (Figs. 19-20). Researchers used this technique to make hollow tubular and conical helices structures, increasing the processing speed by 600 times. However, the research results show that the current 3D projection can only process simple 3D structures. Further researches on 3D exposure processing of complex structures are expected, which will effectively expand its application in various fields. Authors believe that with the effort of researchers on efficiency improvement gradually, TPL can further highlight its advantages to promote the development of life science, materials engineering, micro-nano optics, and many other fields.

基于光束扫描法的光纤预制棒折射率测试仪主要适用于直径和长度在一定范围内的圆柱形样品折射率分布的测试。提出一种套管辅助法可实现更短长度、更细直径和变直径样品的折射率测试。该方法将待测样品居中放置于一个尺寸符合测试要求的圆柱形套管内，并在套管内注入折射率匹配油，使其没过待测样品后按常规步骤进行测试。对比实验结果表明，套管辅助法与直接测量法的偏差与仪器的测量误差相当。采用套管法，获得了预制棒拉丝终止后变径区不同位置折射率的径向分布，可为拉丝过程的研究提供参考。

基于液晶偏振光栅的快速大角度光束偏转技术在航空航天、激光通信、车载雷达、光信息处理、生物医药和**对抗等领域具有重要应用前景，并得到了极大的关注。液晶聚合物偏振光栅可以实现高效率、大角度的光束偏转，并且制备工艺简单、成本低，逐渐被应用到非机械式光束偏转系统中。本文采用两种偏振全息光路分别实现大周期和小周期的液晶聚合物偏振光栅的制备，获得的液晶聚合物偏振光栅最高衍射效率达到99.3%。级联两个液晶聚合物偏振光栅，再层叠液晶聚合物\铁电液晶\液晶聚合物波片组，实现了更大角度范围的偏转，验证了70 μs的4通道光束快速扫描。

甚多孔径光纤激光阵列是构建大功率、高光束质量、等效光学大口径的新兴技术手段之一，而基于相位精密操控实现阵列激光束的共相，乃至快速、灵活的光束偏转是当前光纤激光相控阵技术面向应用的关键。本文将光学相控扫描技术与光纤激光相干合成系统相结合，研究了甚多孔径光纤激光相控阵的光束扫描特性，通过改变准直激光阵列相邻子孔径间的相位差实现了光束扫描。对比分析了19、133、703孔径光纤激光相控阵的远场扫描光束形态分布特征，据此定义并计算了扫描极限范围。该结果为后续开展光纤激光相控阵在长程传输下精确指向控制实验研究提供了理论依据。